Fabrication and uniformity issues in λ/4 shifted DFB laser arrays using e-beam generated contact grating masks

Donald M. Tennant; Thomas L. Koch

doi:10.1016/0167-9317(95)00181-6

Fabrication and uniformity issues in λ/4 shifted DFB laser arrays using e-beam generated contact grating masks

Donald M. Tennant, Thomas L. Koch

Research output: Contribution to journal › Article › peer-review

9 Scopus citations

Abstract

We describe the fabrication and performance of λ/4 shifted DFB laser arrays made using electron beam-generated near field holographic grating masks. Precision requirements for these masks are discussed. We also examine the physical phenomena that contribute to wavelength variations in DFB lasers. Projections are made regarding the epitaxial thickness, composition, and waveguide etching control required to achieve a source wavelength absolute reproducibility of ±0.1 nm.

Original language	English (US)
Pages (from-to)	331-350
Number of pages	20
Journal	Microelectronic Engineering
Volume	32
Issue number	1-4 SPEC. ISS.
DOIs	https://doi.org/10.1016/0167-9317(95)00181-6
State	Published - Sep 1996
Externally published	Yes

Keywords

DFB laser array
Grating mask
Near-field holography
Wavelength division multiplexing

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Surfaces, Coatings and Films
Electrical and Electronic Engineering

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10.1016/0167-9317(95)00181-6

Cite this

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title = "Fabrication and uniformity issues in λ/4 shifted DFB laser arrays using e-beam generated contact grating masks",

abstract = "We describe the fabrication and performance of λ/4 shifted DFB laser arrays made using electron beam-generated near field holographic grating masks. Precision requirements for these masks are discussed. We also examine the physical phenomena that contribute to wavelength variations in DFB lasers. Projections are made regarding the epitaxial thickness, composition, and waveguide etching control required to achieve a source wavelength absolute reproducibility of ±0.1 nm.",

keywords = "DFB laser array, Grating mask, Near-field holography, Wavelength division multiplexing",

author = "Tennant, {Donald M.} and Koch, {Thomas L.}",

year = "1996",

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pages = "331--350",

journal = "Microelectronic Engineering",

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T1 - Fabrication and uniformity issues in λ/4 shifted DFB laser arrays using e-beam generated contact grating masks

AU - Tennant, Donald M.

AU - Koch, Thomas L.

PY - 1996/9

Y1 - 1996/9

N2 - We describe the fabrication and performance of λ/4 shifted DFB laser arrays made using electron beam-generated near field holographic grating masks. Precision requirements for these masks are discussed. We also examine the physical phenomena that contribute to wavelength variations in DFB lasers. Projections are made regarding the epitaxial thickness, composition, and waveguide etching control required to achieve a source wavelength absolute reproducibility of ±0.1 nm.

AB - We describe the fabrication and performance of λ/4 shifted DFB laser arrays made using electron beam-generated near field holographic grating masks. Precision requirements for these masks are discussed. We also examine the physical phenomena that contribute to wavelength variations in DFB lasers. Projections are made regarding the epitaxial thickness, composition, and waveguide etching control required to achieve a source wavelength absolute reproducibility of ±0.1 nm.

KW - DFB laser array

KW - Grating mask

KW - Near-field holography

KW - Wavelength division multiplexing

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JO - Microelectronic Engineering

JF - Microelectronic Engineering

IS - 1-4 SPEC. ISS.

ER -

Fabrication and uniformity issues in λ/4 shifted DFB laser arrays using e-beam generated contact grating masks

Abstract

Keywords

ASJC Scopus subject areas

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