Experimental investigation of photomask with near-field polarization imaging

Tao Chen; Tom D. Milster; Seung Hune Yang

doi:10.1117/12.686420

Experimental investigation of photomask with near-field polarization imaging

Tao Chen, Tom D. Milster, Seung Hune Yang

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

2 Scopus citations

Abstract

Near-field induced polarization imaging with a solid immersion lens (SIL) is used to provide high lateral resolution for both native and induced polarization (cross polarized) images. A new technique is used to obtain height information from the near-field induced polarization image. An AltPSM mask sample is studied with this imaging technique, and compared to imaging with an AFM and a PSI interferometer. Topological data from the near-field induced polarization image are within a few nanometer of the AFM result, without contacting surface. In addition, features due to undercutting the Cr are observable in the induced polarization image.

Original language	English (US)
Title of host publication	Photomask Technology 2006
DOIs	https://doi.org/10.1117/12.686420
State	Published - 2006
Event	26th Annual BACUS Symposium on Photomask Technology 2006 - Monterey, CA, United States Duration: Sep 19 2006 → Sep 22 2006

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	6349 I
ISSN (Print)	0277-786X

Other

Other	26th Annual BACUS Symposium on Photomask Technology 2006
Country/Territory	United States
City	Monterey, CA
Period	9/19/06 → 9/22/06

Keywords

AltPSM
High resolution
Near-field
Polarization
Solid immersion lens (SIL)
Topographical image

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

Access to Document

10.1117/12.686420

Cite this

Chen, T, Milster, TD & Yang, SH 2006, Experimental investigation of photomask with near-field polarization imaging. in Photomask Technology 2006., 634953, Proceedings of SPIE - The International Society for Optical Engineering, vol. 6349 I, 26th Annual BACUS Symposium on Photomask Technology 2006, Monterey, CA, United States, 9/19/06. https://doi.org/10.1117/12.686420

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title = "Experimental investigation of photomask with near-field polarization imaging",

abstract = "Near-field induced polarization imaging with a solid immersion lens (SIL) is used to provide high lateral resolution for both native and induced polarization (cross polarized) images. A new technique is used to obtain height information from the near-field induced polarization image. An AltPSM mask sample is studied with this imaging technique, and compared to imaging with an AFM and a PSI interferometer. Topological data from the near-field induced polarization image are within a few nanometer of the AFM result, without contacting surface. In addition, features due to undercutting the Cr are observable in the induced polarization image.",

keywords = "AltPSM, High resolution, Near-field, Polarization, Solid immersion lens (SIL), Topographical image",

author = "Tao Chen and Milster, {Tom D.} and Yang, {Seung Hune}",

year = "2006",

doi = "10.1117/12.686420",

language = "English (US)",

isbn = "0819464449",

series = "Proceedings of SPIE - The International Society for Optical Engineering",

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note = "26th Annual BACUS Symposium on Photomask Technology 2006 ; Conference date: 19-09-2006 Through 22-09-2006",

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AU - Milster, Tom D.

AU - Yang, Seung Hune

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N2 - Near-field induced polarization imaging with a solid immersion lens (SIL) is used to provide high lateral resolution for both native and induced polarization (cross polarized) images. A new technique is used to obtain height information from the near-field induced polarization image. An AltPSM mask sample is studied with this imaging technique, and compared to imaging with an AFM and a PSI interferometer. Topological data from the near-field induced polarization image are within a few nanometer of the AFM result, without contacting surface. In addition, features due to undercutting the Cr are observable in the induced polarization image.

AB - Near-field induced polarization imaging with a solid immersion lens (SIL) is used to provide high lateral resolution for both native and induced polarization (cross polarized) images. A new technique is used to obtain height information from the near-field induced polarization image. An AltPSM mask sample is studied with this imaging technique, and compared to imaging with an AFM and a PSI interferometer. Topological data from the near-field induced polarization image are within a few nanometer of the AFM result, without contacting surface. In addition, features due to undercutting the Cr are observable in the induced polarization image.

KW - AltPSM

KW - High resolution

KW - Near-field

KW - Polarization

KW - Solid immersion lens (SIL)

KW - Topographical image

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T3 - Proceedings of SPIE - The International Society for Optical Engineering

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ER -

Experimental investigation of photomask with near-field polarization imaging

Abstract

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Keywords

ASJC Scopus subject areas

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