TY - JOUR
T1 - Experimental determination of quantum dipoles at semiconductor heterojunctions prepared by van der Waals epitaxy
T2 - Linear correction term for the electron affinity rule
AU - Schlaf, R.
AU - Lang, O.
AU - Pettenkofer, C.
AU - Jaegermann, W.
AU - Armstrong, N. R.
PY - 1997
Y1 - 1997
N2 - We determined the band offset of eight layered heterocontacts consisting of combinations between SnS2, SnSe2, WSe2, MoS2, MoTe2, InSe, and GaSe. The comparison of offsets predicted by the electron affinity rule (EAR) revealed a systematic deviation. Due to the absence of structural dipoles in layered materials, this deviation corresponds to the magnitude of the quantum dipoles at the interface which allows the development of a quantum dipole correction term for the EAR. The corrected EAR is still a linear rule. The error margin of the corrected EAR lies well within the experimental error of photoemission spectroscopy experiments, thus proving the general applicability of linear rules for the determination of the band offset.
AB - We determined the band offset of eight layered heterocontacts consisting of combinations between SnS2, SnSe2, WSe2, MoS2, MoTe2, InSe, and GaSe. The comparison of offsets predicted by the electron affinity rule (EAR) revealed a systematic deviation. Due to the absence of structural dipoles in layered materials, this deviation corresponds to the magnitude of the quantum dipoles at the interface which allows the development of a quantum dipole correction term for the EAR. The corrected EAR is still a linear rule. The error margin of the corrected EAR lies well within the experimental error of photoemission spectroscopy experiments, thus proving the general applicability of linear rules for the determination of the band offset.
UR - https://www.scopus.com/pages/publications/0011205019
UR - https://www.scopus.com/pages/publications/0011205019#tab=citedBy
U2 - 10.1116/1.580543
DO - 10.1116/1.580543
M3 - Article
AN - SCOPUS:0011205019
SN - 0734-2101
VL - 15
SP - 1365
EP - 1370
JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
IS - 3
ER -