Etching of zirconium oxide, hafnium oxide, and hafnium silicates in dilute hydrofluoric acid solutions

Engineering & Materials Science

• Hafnium oxides 100%
• Hafnium 89%
• Hydrofluoric acid 86%
• Zirconia 67%
• Silicates 65%
• Etching 61%
• Oxides 32%
• Metallorganic chemical vapor deposition 29%
• Wet etching 26%
• Zirconium 23%
• Refractory materials 20%
• Permittivity 18%
• Hot Temperature 9%
• Experiments 6%

Physics & Astronomy

• hafnium oxides 77%
• hydrofluoric acid 70%
• hafnium 70%
• zirconium oxides 58%
• silicates 55%
• etching 42%
• selectivity 35%
• oxides 23%
• refractories 20%
• metalorganic chemical vapor deposition 17%
• permittivity 13%
• heat 12%

Chemical Compounds

• Hafnium Atom 67%
• Etching 51%
• Oxide 30%
• Liquid Film 27%
• Acid 19%
• Refractory 19%
• Chemical Vapour Deposition 17%