@inproceedings{acde3f2db5524eeeb40b21ba36da080e,
title = "Etching of silicon dioxide with gas phase hf and water: Initiation, bulk etching, and termination",
keywords = "Gas phase etching, HF, Surface characterization, Surface preparation, Water",
author = "Gerardo Monta{\~n}o-Miranda and Anthony Muscat",
year = "2008",
doi = "10.4028/www.scientific.net/SSP.134.3",
language = "English (US)",
isbn = "9783908451464",
series = "Solid State Phenomena",
publisher = "Trans Tech Publications Ltd",
pages = "3--6",
editor = "Paul Mertens and Marc Meuris and Marc Heyns",
booktitle = "Ultra Clean Processing of Semiconductor Surfaces VIII",
note = "8th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2006 ; Conference date: 18-09-2006 Through 20-09-2006",
}