Electrooptic polymer modulator with single-mode to multimode waveguide transitions

Christopher T. DeRose; David Mathine; Yasufumi Enami; Robert A. Norwood; Jingdong Luo; Alex K.Y. Jen; Nasser Peyghambarian

doi:10.1109/LPT.2008.924177

Electrooptic polymer modulator with single-mode to multimode waveguide transitions

Christopher T. DeRose
, David Mathine
, Yasufumi Enami
, Robert A. Norwood
, Jingdong Luo
, Alex K.Y. Jen
, Nasser Peyghambarian

Research output: Contribution to journal › Article › peer-review

19 Scopus citations

Abstract

Grayscale lithography has been used to create refractive index (RI) tapers in an electrooptic (EO) polymer modulator. These RI tapers are used to convert a passive single-mode photobleached polymer waveguide to the fundamental mode of an unbleached, active multimode polymer waveguide. The benefits of this modulator design include a coupling loss reduction of 2.6 dB per interface and an increased confinement factor of 0.83. Using this design, an EO polymer modulator was fabricated with a halfwave voltage of 1.9 V, modulation extinction ratio of 15 dB, and a fiber to lens insertion loss of 11.6 dB.

Original language	English (US)
Pages (from-to)	1051-1053
Number of pages	3
Journal	IEEE Photonics Technology Letters
Volume	20
Issue number	12
DOIs	https://doi.org/10.1109/LPT.2008.924177
State	Published - Jun 15 2008

Keywords

Electrooptic (EO) polymer
Grayscale lithography
Modulator
Sol-gel

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Electrical and Electronic Engineering

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10.1109/LPT.2008.924177

Cite this

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title = "Electrooptic polymer modulator with single-mode to multimode waveguide transitions",

abstract = "Grayscale lithography has been used to create refractive index (RI) tapers in an electrooptic (EO) polymer modulator. These RI tapers are used to convert a passive single-mode photobleached polymer waveguide to the fundamental mode of an unbleached, active multimode polymer waveguide. The benefits of this modulator design include a coupling loss reduction of 2.6 dB per interface and an increased confinement factor of 0.83. Using this design, an EO polymer modulator was fabricated with a halfwave voltage of 1.9 V, modulation extinction ratio of 15 dB, and a fiber to lens insertion loss of 11.6 dB.",

keywords = "Electrooptic (EO) polymer, Grayscale lithography, Modulator, Sol-gel",

author = "DeRose, \{Christopher T.\} and David Mathine and Yasufumi Enami and Norwood, \{Robert A.\} and Jingdong Luo and Jen, \{Alex K.Y.\} and Nasser Peyghambarian",

note = "Funding Information: Manuscript received December 13, 2007; revised March 25, 2008. This work was supported by the National Science Foundation MDITR Science and Technology Center under Grant \#-0120967, by Nitto Denko Technical, Oceanside, CA, and by the DARPA Phase II and Air Force STTR programs.",

year = "2008",

month = jun,

day = "15",

doi = "10.1109/LPT.2008.924177",

language = "English (US)",

volume = "20",

pages = "1051--1053",

journal = "IEEE Photonics Technology Letters",

issn = "1041-1135",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

number = "12",

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TY - JOUR

T1 - Electrooptic polymer modulator with single-mode to multimode waveguide transitions

AU - DeRose, Christopher T.

AU - Mathine, David

AU - Enami, Yasufumi

AU - Norwood, Robert A.

AU - Luo, Jingdong

AU - Jen, Alex K.Y.

AU - Peyghambarian, Nasser

N1 - Funding Information: Manuscript received December 13, 2007; revised March 25, 2008. This work was supported by the National Science Foundation MDITR Science and Technology Center under Grant #-0120967, by Nitto Denko Technical, Oceanside, CA, and by the DARPA Phase II and Air Force STTR programs.

PY - 2008/6/15

Y1 - 2008/6/15

N2 - Grayscale lithography has been used to create refractive index (RI) tapers in an electrooptic (EO) polymer modulator. These RI tapers are used to convert a passive single-mode photobleached polymer waveguide to the fundamental mode of an unbleached, active multimode polymer waveguide. The benefits of this modulator design include a coupling loss reduction of 2.6 dB per interface and an increased confinement factor of 0.83. Using this design, an EO polymer modulator was fabricated with a halfwave voltage of 1.9 V, modulation extinction ratio of 15 dB, and a fiber to lens insertion loss of 11.6 dB.

AB - Grayscale lithography has been used to create refractive index (RI) tapers in an electrooptic (EO) polymer modulator. These RI tapers are used to convert a passive single-mode photobleached polymer waveguide to the fundamental mode of an unbleached, active multimode polymer waveguide. The benefits of this modulator design include a coupling loss reduction of 2.6 dB per interface and an increased confinement factor of 0.83. Using this design, an EO polymer modulator was fabricated with a halfwave voltage of 1.9 V, modulation extinction ratio of 15 dB, and a fiber to lens insertion loss of 11.6 dB.

KW - Electrooptic (EO) polymer

KW - Grayscale lithography

KW - Modulator

KW - Sol-gel

UR - https://www.scopus.com/pages/publications/58049136569

UR - https://www.scopus.com/pages/publications/58049136569#tab=citedBy

U2 - 10.1109/LPT.2008.924177

DO - 10.1109/LPT.2008.924177

M3 - Article

AN - SCOPUS:58049136569

SN - 1041-1135

VL - 20

SP - 1051

EP - 1053

JO - IEEE Photonics Technology Letters

JF - IEEE Photonics Technology Letters

IS - 12

ER -

Electrooptic polymer modulator with single-mode to multimode waveguide transitions

Abstract

Keywords

ASJC Scopus subject areas

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