Electron radiation sensitive hybrid sol-gel materials for electron-beam lithography and diffractive optics

J. T. Rantala; R. S. Penner; S. Honkanen; N. Nordman; O. Nordman; J. Vähäkangas; M. Fallahi; N. Peyghambarian

doi:10.1117/12.312923

Electron radiation sensitive hybrid sol-gel materials for electron-beam lithography and diffractive optics

J. T. Rantala, R. S. Penner, S. Honkanen, N. Nordman, O. Nordman, J. Vähäkangas, M. Fallahi, N. Peyghambarian

Research output: Contribution to journal › Conference article › peer-review

4 Scopus citations

Abstract

We present two techniques to use hybrid sol-gel materials for electron-beam lithography and direct writing of surface relief diffractive elements. We are able to obtain direct physical electron beam etching of hybrid sol-gel glass and variable-doses can induce complex multi-phase-level diffractive elements and apodized sol-gel waveguide gratings. We are also able to obtain hybrid sol-gel glass formation under the electron radiation, so that material can be used as a negative resist in electron-beam lithography. Both of these techniques are promising for the fabrication of submicron optical components and micromachining tools such as embossing masters for the replication.

Original language	English (US)
Pages (from-to)	30-37
Number of pages	8
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	3469
DOIs	https://doi.org/10.1117/12.312923
State	Published - Jul 6 1998
Event	Organic-Inorganic Hybrid Materials for Photonics 1998 - San Diego, United States Duration: Jul 19 1998 → Jul 24 1998

Keywords

And sol-gel resist
Diffractive elements
Electron beam writing
Hybrid sol-gel
Integrated optics

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

Access to Document

10.1117/12.312923

Cite this

@article{6af58e5d23f7498086843fd2b7027db0,

title = "Electron radiation sensitive hybrid sol-gel materials for electron-beam lithography and diffractive optics",

abstract = "We present two techniques to use hybrid sol-gel materials for electron-beam lithography and direct writing of surface relief diffractive elements. We are able to obtain direct physical electron beam etching of hybrid sol-gel glass and variable-doses can induce complex multi-phase-level diffractive elements and apodized sol-gel waveguide gratings. We are also able to obtain hybrid sol-gel glass formation under the electron radiation, so that material can be used as a negative resist in electron-beam lithography. Both of these techniques are promising for the fabrication of submicron optical components and micromachining tools such as embossing masters for the replication.",

keywords = "And sol-gel resist, Diffractive elements, Electron beam writing, Hybrid sol-gel, Integrated optics",

author = "Rantala, {J. T.} and Penner, {R. S.} and S. Honkanen and N. Nordman and O. Nordman and J. V{\"a}h{\"a}kangas and M. Fallahi and N. Peyghambarian",

note = "Funding Information: This work was partially supported by DARPA and Technology Development Center of Finland. Publisher Copyright: {\textcopyright} 1998 SPIE. All rights reserved.; Organic-Inorganic Hybrid Materials for Photonics 1998 ; Conference date: 19-07-1998 Through 24-07-1998",

year = "1998",

month = jul,

day = "6",

doi = "10.1117/12.312923",

language = "English (US)",

volume = "3469",

pages = "30--37",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

publisher = "SPIE",

}

TY - JOUR

T1 - Electron radiation sensitive hybrid sol-gel materials for electron-beam lithography and diffractive optics

AU - Rantala, J. T.

AU - Penner, R. S.

AU - Honkanen, S.

AU - Nordman, N.

AU - Nordman, O.

AU - Vähäkangas, J.

AU - Fallahi, M.

AU - Peyghambarian, N.

PY - 1998/7/6

Y1 - 1998/7/6

N2 - We present two techniques to use hybrid sol-gel materials for electron-beam lithography and direct writing of surface relief diffractive elements. We are able to obtain direct physical electron beam etching of hybrid sol-gel glass and variable-doses can induce complex multi-phase-level diffractive elements and apodized sol-gel waveguide gratings. We are also able to obtain hybrid sol-gel glass formation under the electron radiation, so that material can be used as a negative resist in electron-beam lithography. Both of these techniques are promising for the fabrication of submicron optical components and micromachining tools such as embossing masters for the replication.

AB - We present two techniques to use hybrid sol-gel materials for electron-beam lithography and direct writing of surface relief diffractive elements. We are able to obtain direct physical electron beam etching of hybrid sol-gel glass and variable-doses can induce complex multi-phase-level diffractive elements and apodized sol-gel waveguide gratings. We are also able to obtain hybrid sol-gel glass formation under the electron radiation, so that material can be used as a negative resist in electron-beam lithography. Both of these techniques are promising for the fabrication of submicron optical components and micromachining tools such as embossing masters for the replication.

KW - And sol-gel resist

KW - Diffractive elements

KW - Electron beam writing

KW - Hybrid sol-gel

KW - Integrated optics

UR - http://www.scopus.com/inward/record.url?scp=84959195688&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84959195688&partnerID=8YFLogxK

U2 - 10.1117/12.312923

DO - 10.1117/12.312923

M3 - Conference article

AN - SCOPUS:84959195688

SN - 0277-786X

VL - 3469

SP - 30

EP - 37

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

T2 - Organic-Inorganic Hybrid Materials for Photonics 1998

Y2 - 19 July 1998 through 24 July 1998

ER -

Electron radiation sensitive hybrid sol-gel materials for electron-beam lithography and diffractive optics

Abstract

Keywords

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this