Electron beam induced changes in the refractive index and film thickness of amorphous AsxS100-x and AsxSe100-x films

Olli Nordman; Nina Nordman; Nasser Peyghambarian

doi:10.1063/1.368915

Electron beam induced changes in the refractive index and film thickness of amorphous As_xS_100-x and As_xSe_100-x films

Olli Nordman, Nina Nordman, Nasser Peyghambarian

Research output: Contribution to journal › Article › peer-review

41 Scopus citations

Abstract

In this article, electron beam induced changes in the refractive index and film thickness of time relaxed amorphous As_xS_100-x (with x = 30-45) and As_xSe_100-x (with x = 40-70) are studied. The largest index change (∼0.08) in As_xS_100-x films is found when x = 40. The corresponding value (∼0.06) for As_xSe_100-x films is met when x = 55. The difference in the best compositions is attributed to the different relaxation processes of As-S and As-Se films. Electron beam irradiation causes surface shrinkage of the films. In As_xSe_100-x films contactions are deepest (∼75 nm) when x = 55.

Original language	English (US)
Pages (from-to)	6055-6058
Number of pages	4
Journal	Journal of Applied Physics
Volume	84
Issue number	11
DOIs	https://doi.org/10.1063/1.368915
State	Published - Dec 1 1998

ASJC Scopus subject areas

General Physics and Astronomy

Access to Document

10.1063/1.368915

Cite this

@article{69e2ca37a4a44218902b906763bc00c2,

title = "Electron beam induced changes in the refractive index and film thickness of amorphous AsxS100-x and AsxSe100-x films",

abstract = "In this article, electron beam induced changes in the refractive index and film thickness of time relaxed amorphous AsxS100-x (with x = 30-45) and AsxSe100-x (with x = 40-70) are studied. The largest index change (∼0.08) in AsxS100-x films is found when x = 40. The corresponding value (∼0.06) for AsxSe100-x films is met when x = 55. The difference in the best compositions is attributed to the different relaxation processes of As-S and As-Se films. Electron beam irradiation causes surface shrinkage of the films. In AsxSe100-x films contactions are deepest (∼75 nm) when x = 55.",

author = "Olli Nordman and Nina Nordman and Nasser Peyghambarian",

year = "1998",

month = dec,

day = "1",

doi = "10.1063/1.368915",

language = "English (US)",

volume = "84",

pages = "6055--6058",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics",

number = "11",

}

TY - JOUR

T1 - Electron beam induced changes in the refractive index and film thickness of amorphous AsxS100-x and AsxSe100-x films

AU - Nordman, Olli

AU - Nordman, Nina

AU - Peyghambarian, Nasser

PY - 1998/12/1

Y1 - 1998/12/1

N2 - In this article, electron beam induced changes in the refractive index and film thickness of time relaxed amorphous AsxS100-x (with x = 30-45) and AsxSe100-x (with x = 40-70) are studied. The largest index change (∼0.08) in AsxS100-x films is found when x = 40. The corresponding value (∼0.06) for AsxSe100-x films is met when x = 55. The difference in the best compositions is attributed to the different relaxation processes of As-S and As-Se films. Electron beam irradiation causes surface shrinkage of the films. In AsxSe100-x films contactions are deepest (∼75 nm) when x = 55.

AB - In this article, electron beam induced changes in the refractive index and film thickness of time relaxed amorphous AsxS100-x (with x = 30-45) and AsxSe100-x (with x = 40-70) are studied. The largest index change (∼0.08) in AsxS100-x films is found when x = 40. The corresponding value (∼0.06) for AsxSe100-x films is met when x = 55. The difference in the best compositions is attributed to the different relaxation processes of As-S and As-Se films. Electron beam irradiation causes surface shrinkage of the films. In AsxSe100-x films contactions are deepest (∼75 nm) when x = 55.

UR - https://www.scopus.com/pages/publications/0001698010

UR - https://www.scopus.com/inward/citedby.url?scp=0001698010&partnerID=8YFLogxK

U2 - 10.1063/1.368915

DO - 10.1063/1.368915

M3 - Article

AN - SCOPUS:0001698010

SN - 0021-8979

VL - 84

SP - 6055

EP - 6058

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 11

ER -

Electron beam induced changes in the refractive index and film thickness of amorphous As_xS_100-x and As_xSe_100-x films

Abstract

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this