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Electrochemical behavior of copper in tetramethyl ammonium hydroxide based solutions
W. H. Huang
, S. Raghavan
, Y. Fang
,
L. Zhang
Research output
:
Contribution to journal
›
Article
›
peer-review
9
Scopus citations
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Keyphrases
Electrochemical Performance
100%
Tetramethylammonium Hydroxide
100%
Ammonium Hydroxide
80%
Copper Corrosion
40%
Low Dose Rate
20%
Hydrogen Peroxide
20%
PH Value
20%
Polyvinyl Alcohol
20%
Abrasion
20%
Alkaline Solution
20%
Hydrogen Peroxide Effect
20%
Tantalum
20%
Galvanic Interaction
20%
Material Science
Hydrogen Peroxide
100%
Corrosion
100%
Tantalum
50%
Chemical Engineering
Ammonium Hydroxide
100%
Hydrogen Peroxide
33%
Polyvinyl Alcohol
16%
Engineering
Galvanic Interaction
100%