Elastic Strain Engineering for Ultralow Mechanical Dissipation

Nils J. Engelsen; Amir H. Ghadimi; Sergey A. Fedorov; Tobias J. Kippenberg; Mohammad J. Bereyhi; Ryan D. Schilling; Dalziel J. Wilson

doi:10.1109/OMN.2018.8454645

Elastic Strain Engineering for Ultralow Mechanical Dissipation

Nils J. Engelsen, Amir H. Ghadimi, Sergey A. Fedorov, Tobias J. Kippenberg, Mohammad J. Bereyhi, Ryan D. Schilling, Dalziel J. Wilson

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

Extreme stresses can be produced in nanoscale structures, a feature which has been used to realize enhanced materials properties, such as the high mobility of silicon in modern transistors. Here we show how nanoscale stress can be used to realize exceptionally low mechanical dissipation, when combined with 'soft-clamping'-a form of phononic engineering. Specifically, using a non-uniform phononic crystal pattern, we colocalize the strain and flexural motion of a freestanding Si₃N₄ nanobeam. Ringdown measurements at room temperature reveal string-like modes with quality Q factors as high as 800 million and Q× frequency exceeding 10¹⁵Hz.

Original language	English (US)
Title of host publication	International Conference on Optical MEMS and Nanophotonics, OMN 2018 - Proceedings
Publisher	IEEE Computer Society
ISBN (Print)	9781509063727
DOIs	https://doi.org/10.1109/OMN.2018.8454645
State	Published - Sep 4 2018
Externally published	Yes
Event	23rd International Conference on Optical MEMS and Nanophotonics, OMN 2018 - Lausanne, Switzerland Duration: Jul 29 2018 → Aug 2 2018

Publication series

Name	International Conference on Optical MEMS and Nanophotonics
Volume	2018-July
ISSN (Print)	2160-5033
ISSN (Electronic)	2160-5041

Conference

Conference	23rd International Conference on Optical MEMS and Nanophotonics, OMN 2018
Country/Territory	Switzerland
City	Lausanne
Period	7/29/18 → 8/2/18

Keywords

nanomechanics
optomechanics
strain engineering

ASJC Scopus subject areas

Hardware and Architecture
Electrical and Electronic Engineering
Electronic, Optical and Magnetic Materials

Access to Document

10.1109/OMN.2018.8454645

Cite this

Engelsen, N. J., Ghadimi, A. H., Fedorov, S. A., Kippenberg, T. J., Bereyhi, M. J., Schilling, R. D., & Wilson, D. J. (2018). Elastic Strain Engineering for Ultralow Mechanical Dissipation. In International Conference on Optical MEMS and Nanophotonics, OMN 2018 - Proceedings Article 8454645 (International Conference on Optical MEMS and Nanophotonics; Vol. 2018-July). IEEE Computer Society. https://doi.org/10.1109/OMN.2018.8454645

Elastic Strain Engineering for Ultralow Mechanical Dissipation. / Engelsen, Nils J.; Ghadimi, Amir H.; Fedorov, Sergey A. et al.
International Conference on Optical MEMS and Nanophotonics, OMN 2018 - Proceedings. IEEE Computer Society, 2018. 8454645 (International Conference on Optical MEMS and Nanophotonics; Vol. 2018-July).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Engelsen, NJ, Ghadimi, AH, Fedorov, SA, Kippenberg, TJ, Bereyhi, MJ, Schilling, RD & Wilson, DJ 2018, Elastic Strain Engineering for Ultralow Mechanical Dissipation. in International Conference on Optical MEMS and Nanophotonics, OMN 2018 - Proceedings., 8454645, International Conference on Optical MEMS and Nanophotonics, vol. 2018-July, IEEE Computer Society, 23rd International Conference on Optical MEMS and Nanophotonics, OMN 2018, Lausanne, Switzerland, 7/29/18. https://doi.org/10.1109/OMN.2018.8454645

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title = "Elastic Strain Engineering for Ultralow Mechanical Dissipation",

abstract = "Extreme stresses can be produced in nanoscale structures, a feature which has been used to realize enhanced materials properties, such as the high mobility of silicon in modern transistors. Here we show how nanoscale stress can be used to realize exceptionally low mechanical dissipation, when combined with 'soft-clamping'-a form of phononic engineering. Specifically, using a non-uniform phononic crystal pattern, we colocalize the strain and flexural motion of a freestanding Si3N4 nanobeam. Ringdown measurements at room temperature reveal string-like modes with quality Q factors as high as 800 million and Q× frequency exceeding 1015Hz.",

keywords = "nanomechanics, optomechanics, strain engineering",

author = "Engelsen, \{Nils J.\} and Ghadimi, \{Amir H.\} and Fedorov, \{Sergey A.\} and Kippenberg, \{Tobias J.\} and Bereyhi, \{Mohammad J.\} and Schilling, \{Ryan D.\} and Wilson, \{Dalziel J.\}",

note = "Funding Information: This work was supported by the EU Horizon 2020 Research and Innovation Program under grant agreement no. 732894 (FET Proactive HOT) and the SNF Cavity Quantum Optomechanics project (grant no. 163387). M.J.B. is supported by MSCA ETN-OMT (grant no. 722923). T.J.K acknowledges support from ERC AdG (QuREM, grant no. 320966). All samples were fabricated at the Center for MicroNanoTechnology (CMi) at EPFL. Publisher Copyright: {\textcopyright} 2018 IEEE.; 23rd International Conference on Optical MEMS and Nanophotonics, OMN 2018 ; Conference date: 29-07-2018 Through 02-08-2018",

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doi = "10.1109/OMN.2018.8454645",

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AU - Bereyhi, Mohammad J.

AU - Schilling, Ryan D.

AU - Wilson, Dalziel J.

N1 - Funding Information: This work was supported by the EU Horizon 2020 Research and Innovation Program under grant agreement no. 732894 (FET Proactive HOT) and the SNF Cavity Quantum Optomechanics project (grant no. 163387). M.J.B. is supported by MSCA ETN-OMT (grant no. 722923). T.J.K acknowledges support from ERC AdG (QuREM, grant no. 320966). All samples were fabricated at the Center for MicroNanoTechnology (CMi) at EPFL. Publisher Copyright: © 2018 IEEE.

PY - 2018/9/4

Y1 - 2018/9/4

N2 - Extreme stresses can be produced in nanoscale structures, a feature which has been used to realize enhanced materials properties, such as the high mobility of silicon in modern transistors. Here we show how nanoscale stress can be used to realize exceptionally low mechanical dissipation, when combined with 'soft-clamping'-a form of phononic engineering. Specifically, using a non-uniform phononic crystal pattern, we colocalize the strain and flexural motion of a freestanding Si3N4 nanobeam. Ringdown measurements at room temperature reveal string-like modes with quality Q factors as high as 800 million and Q× frequency exceeding 1015Hz.

AB - Extreme stresses can be produced in nanoscale structures, a feature which has been used to realize enhanced materials properties, such as the high mobility of silicon in modern transistors. Here we show how nanoscale stress can be used to realize exceptionally low mechanical dissipation, when combined with 'soft-clamping'-a form of phononic engineering. Specifically, using a non-uniform phononic crystal pattern, we colocalize the strain and flexural motion of a freestanding Si3N4 nanobeam. Ringdown measurements at room temperature reveal string-like modes with quality Q factors as high as 800 million and Q× frequency exceeding 1015Hz.

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KW - optomechanics

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Elastic Strain Engineering for Ultralow Mechanical Dissipation

Abstract

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Keywords

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