Elastic Strain Engineering for Ultralow Mechanical Dissipation

Nils J. Engelsen, Amir H. Ghadimi, Sergey A. Fedorov, Tobias J. Kippenberg, Mohammad J. Bereyhi, Ryan D. Schilling, Dalziel J. Wilson

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Extreme stresses can be produced in nanoscale structures, a feature which has been used to realize enhanced materials properties, such as the high mobility of silicon in modern transistors. Here we show how nanoscale stress can be used to realize exceptionally low mechanical dissipation, when combined with 'soft-clamping'-a form of phononic engineering. Specifically, using a non-uniform phononic crystal pattern, we colocalize the strain and flexural motion of a freestanding Si3N4 nanobeam. Ringdown measurements at room temperature reveal string-like modes with quality Q factors as high as 800 million and Q× frequency exceeding 1015Hz.

Original languageEnglish (US)
Title of host publicationInternational Conference on Optical MEMS and Nanophotonics, OMN 2018 - Proceedings
PublisherIEEE Computer Society
ISBN (Print)9781509063727
DOIs
StatePublished - Sep 4 2018
Externally publishedYes
Event23rd International Conference on Optical MEMS and Nanophotonics, OMN 2018 - Lausanne, Switzerland
Duration: Jul 29 2018Aug 2 2018

Publication series

NameInternational Conference on Optical MEMS and Nanophotonics
Volume2018-July
ISSN (Print)2160-5033
ISSN (Electronic)2160-5041

Conference

Conference23rd International Conference on Optical MEMS and Nanophotonics, OMN 2018
Country/TerritorySwitzerland
CityLausanne
Period7/29/188/2/18

Keywords

  • nanomechanics
  • optomechanics
  • strain engineering

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials

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