Elastic strain engineering for ultralow mechanical dissipation

A. H. Ghadimi, S. A. Fedorov, N. J. Engelsen, M. J. Bereyhi, R. Schilling, D. J. Wilson, T. J. Kippenberg

Research output: Contribution to journalArticlepeer-review

225 Scopus citations


Extreme stresses can be produced in nanoscale structures; this feature has been used to realize enhanced materials properties, such as the high mobility of silicon in modern transistors.We show how nanoscale stress can be used to realize exceptionally low mechanical dissipation when combined with "soft-clamping"-a form of phononic engineering. Specifically, using a nonuniform phononic crystal pattern, we colocalize the strain and flexural motion of a free-standing silicon nitride nanobeam. Ringdown measurements at room temperature reveal string-like vibrational modes with quality (Q) factors as high as 800 million and Q × frequency exceeding 1015 hertz. These results illustrate a promising route for engineering ultracoherent nanomechanical devices.

Original languageEnglish (US)
Pages (from-to)764-768
Number of pages5
Issue number6390
StatePublished - May 18 2018
Externally publishedYes

ASJC Scopus subject areas

  • General


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