Efficient statistical capacitance variability modeling with orthogonal principle factor analysis

Rong Jiang, Wenyin Fu, Janet Meiling Wang, Vince Lin, Charlie Chung Ping Chen

Research output: Chapter in Book/Report/Conference proceedingConference contribution

25 Scopus citations


Due to the ever-increasing complexity of VLSI designs and IC process technologies, the mismatch between a circuit fabricated on the wafer and the one designed in the layout tool grows ever larger. Therefore, characterizing and modeling process variations of interconnect geometry has become an integral part of analysis and optimization of modern VLSI designs. In this paper, we present a systematic methodology to develop a closed form capacitance model, which accurately captures the nonlinear relationship between parasitic capacitances and dominant global/local process variation parameters. The explicit capacitance representation applies the orthogonal principle factor analysis to greatly reduce the number of random variables associated with modeling conductor surface fluctuations while preserving the dominant sources of variations, and consequently the variational capacitance model can be efficiently utilized by statistical model order reduction and timing analysis tools. Experimental results demonstrate that the proposed method exhibits over 100× speedup compared with Monte Carlo simulation while having the advantage of generating explicit variational parasitic capacitance models of high order accuracy.

Original languageEnglish (US)
Title of host publicationProceedings of theICCAD-2005
Subtitle of host publicationInternational Conference on Computer-Aided Design
PublisherInstitute of Electrical and Electronics Engineers Inc.
Number of pages8
ISBN (Print)078039254X, 9780780392540
StatePublished - 2005
EventICCAD-2005: IEEE/ACM International Conference on Computer-Aided Design, 2005 - San Jose, CA, United States
Duration: Nov 6 2005Nov 10 2005

Publication series

NameIEEE/ACM International Conference on Computer-Aided Design, Digest of Technical Papers, ICCAD
ISSN (Print)1092-3152


OtherICCAD-2005: IEEE/ACM International Conference on Computer-Aided Design, 2005
Country/TerritoryUnited States
CitySan Jose, CA


  • Capacitance
  • Parasitic extraction
  • Principle factor analysis
  • Process variations
  • Random variable reduction

ASJC Scopus subject areas

  • Software
  • Computer Science Applications
  • Computer Graphics and Computer-Aided Design


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