Effect of System Interactions on the Removal of Total Oxidizable Carbon from DI Water Polishing Loops

Robert A. Governal; Alison Bonner; Farhang Shadman

doi:10.1109/66.121983

Effect of System Interactions on the Removal of Total Oxidizable Carbon from DI Water Polishing Loops

Robert A. Governal, Alison Bonner, Farhang Shadman

Research output: Contribution to journal › Article › peer-review

Abstract

Ultra-pure water systems in semiconductor plants consist of many components. Although the operating principles behind each component are well-known, the interactions between system components, including cancellation and synergism, are not generally understood and taken into account. In this study, two examples of these interactions are studied and analyzed: UV interactions with membrane filters and UV interactions with ion exchange units. The results indicate that the sequencing of UV and filter affect the total oxidizable carbon removal efficiency and it is preferable to have filter before UV. UV followed by ion exchange is an effective configuration for some impurities but can be undesirable for some contaminants and particles.

Original language	English (US)
Pages (from-to)	70-73
Number of pages	4
Journal	IEEE Transactions on Semiconductor Manufacturing
Volume	5
Issue number	1
DOIs	https://doi.org/10.1109/66.121983
State	Published - Feb 1992

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Industrial and Manufacturing Engineering
Electrical and Electronic Engineering

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@article{62a9257f78a8487b9835fe77e0f9c388,

title = "Effect of System Interactions on the Removal of Total Oxidizable Carbon from DI Water Polishing Loops",

abstract = "Ultra-pure water systems in semiconductor plants consist of many components. Although the operating principles behind each component are well-known, the interactions between system components, including cancellation and synergism, are not generally understood and taken into account. In this study, two examples of these interactions are studied and analyzed: UV interactions with membrane filters and UV interactions with ion exchange units. The results indicate that the sequencing of UV and filter affect the total oxidizable carbon removal efficiency and it is preferable to have filter before UV. UV followed by ion exchange is an effective configuration for some impurities but can be undesirable for some contaminants and particles.",

author = "Governal, {Robert A.} and Alison Bonner and Farhang Shadman",

year = "1992",

month = feb,

doi = "10.1109/66.121983",

language = "English (US)",

volume = "5",

pages = "70--73",

journal = "IEEE Transactions on Semiconductor Manufacturing",

issn = "0894-6507",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

number = "1",

}

TY - JOUR

T1 - Effect of System Interactions on the Removal of Total Oxidizable Carbon from DI Water Polishing Loops

AU - Governal, Robert A.

AU - Bonner, Alison

AU - Shadman, Farhang

PY - 1992/2

Y1 - 1992/2

N2 - Ultra-pure water systems in semiconductor plants consist of many components. Although the operating principles behind each component are well-known, the interactions between system components, including cancellation and synergism, are not generally understood and taken into account. In this study, two examples of these interactions are studied and analyzed: UV interactions with membrane filters and UV interactions with ion exchange units. The results indicate that the sequencing of UV and filter affect the total oxidizable carbon removal efficiency and it is preferable to have filter before UV. UV followed by ion exchange is an effective configuration for some impurities but can be undesirable for some contaminants and particles.

AB - Ultra-pure water systems in semiconductor plants consist of many components. Although the operating principles behind each component are well-known, the interactions between system components, including cancellation and synergism, are not generally understood and taken into account. In this study, two examples of these interactions are studied and analyzed: UV interactions with membrane filters and UV interactions with ion exchange units. The results indicate that the sequencing of UV and filter affect the total oxidizable carbon removal efficiency and it is preferable to have filter before UV. UV followed by ion exchange is an effective configuration for some impurities but can be undesirable for some contaminants and particles.

UR - http://www.scopus.com/inward/record.url?scp=0026817933&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0026817933&partnerID=8YFLogxK

U2 - 10.1109/66.121983

DO - 10.1109/66.121983

M3 - Article

AN - SCOPUS:0026817933

SN - 0894-6507

VL - 5

SP - 70

EP - 73

JO - IEEE Transactions on Semiconductor Manufacturing

JF - IEEE Transactions on Semiconductor Manufacturing

IS - 1

ER -

Effect of System Interactions on the Removal of Total Oxidizable Carbon from DI Water Polishing Loops

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