Abstract
The surface properties of a filter were chosen to have complete retention of both PSL and silicon nitride particles in a wide pH range of HF. Particles were removed by non-sieving mechanisms, allowing the filter to have large pores resulting in high flow rate.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 271-274 |
| Number of pages | 4 |
| Journal | Diffusion and Defect Data Pt.B: Solid State Phenomena |
| Volume | 76-77 |
| State | Published - 2000 |
| Event | 5th Internatinal Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS 2000) - Ostend, Belgium Duration: Sep 18 2000 → Sep 20 2000 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- General Materials Science
- Condensed Matter Physics
- Physics and Astronomy (miscellaneous)