Effect of surface charge and fluid properties on particle removal characteristics of a surface-optimized REB filter

Wayne P. Kelly; Donald C. Grant; Joseph Zahka; Wayne Huang; Srini Raghavan

doi:10.4028/www.scientific.net/SSP.76-77.271

Effect of surface charge and fluid properties on particle removal characteristics of a surface-optimized REB filter

Wayne P. Kelly, Donald C. Grant, Joseph Zahka, Wayne Huang, Srini Raghavan

Materials Science and Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Original language	English (US)
Title of host publication	Ultra Clean Processing of Silicon Surfaces 2000
Editors	Marc Heyns, Paul Mertens, Marc Meuris
Publisher	Trans Tech Publications Ltd
Pages	271-274
Number of pages	4
ISBN (Print)	9783908450573
DOIs	https://doi.org/10.4028/www.scientific.net/SSP.76-77.271
State	Published - 2001
Event	5th International Symposium on Ultra Clean Processing of Silicon Surfaces, UCPSS 2000 - Ostend, Belgium Duration: Sep 18 2000 → Sep 20 2000

Publication series

Name	Solid State Phenomena
Volume	76-77
ISSN (Print)	1012-0394
ISSN (Electronic)	1662-9779

Other

Other	5th International Symposium on Ultra Clean Processing of Silicon Surfaces, UCPSS 2000
Country/Territory	Belgium
City	Ostend
Period	9/18/00 → 9/20/00

Keywords

Filters
Retention
Zeta potential

ASJC Scopus subject areas

Atomic and Molecular Physics, and Optics
General Materials Science
Condensed Matter Physics

Access to Document

10.4028/www.scientific.net/SSP.76-77.271

Cite this

Kelly, W. P., Grant, D. C., Zahka, J., Huang, W., & Raghavan, S. (2001). Effect of surface charge and fluid properties on particle removal characteristics of a surface-optimized REB filter. In M. Heyns, P. Mertens, & M. Meuris (Eds.), Ultra Clean Processing of Silicon Surfaces 2000 (pp. 271-274). (Solid State Phenomena; Vol. 76-77). Trans Tech Publications Ltd. https://doi.org/10.4028/www.scientific.net/SSP.76-77.271

Effect of surface charge and fluid properties on particle removal characteristics of a surface-optimized REB filter. / Kelly, Wayne P.; Grant, Donald C.; Zahka, Joseph et al.
Ultra Clean Processing of Silicon Surfaces 2000. ed. / Marc Heyns; Paul Mertens; Marc Meuris. Trans Tech Publications Ltd, 2001. p. 271-274 (Solid State Phenomena; Vol. 76-77).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Kelly, WP, Grant, DC, Zahka, J, Huang, W & Raghavan, S 2001, Effect of surface charge and fluid properties on particle removal characteristics of a surface-optimized REB filter. in M Heyns, P Mertens & M Meuris (eds), Ultra Clean Processing of Silicon Surfaces 2000. Solid State Phenomena, vol. 76-77, Trans Tech Publications Ltd, pp. 271-274, 5th International Symposium on Ultra Clean Processing of Silicon Surfaces, UCPSS 2000, Ostend, Belgium, 9/18/00. https://doi.org/10.4028/www.scientific.net/SSP.76-77.271

Kelly WP, Grant DC, Zahka J, Huang W, Raghavan S. Effect of surface charge and fluid properties on particle removal characteristics of a surface-optimized REB filter. In Heyns M, Mertens P, Meuris M, editors, Ultra Clean Processing of Silicon Surfaces 2000. Trans Tech Publications Ltd. 2001. p. 271-274. (Solid State Phenomena). doi: 10.4028/www.scientific.net/SSP.76-77.271

@inproceedings{1e402a05a3c6493597fd32b9e72de768,

title = "Effect of surface charge and fluid properties on particle removal characteristics of a surface-optimized REB filter",

keywords = "Filters, Retention, Zeta potential",

author = "Kelly, {Wayne P.} and Grant, {Donald C.} and Joseph Zahka and Wayne Huang and Srini Raghavan",

year = "2001",

doi = "10.4028/www.scientific.net/SSP.76-77.271",

language = "English (US)",

isbn = "9783908450573",

series = "Solid State Phenomena",

publisher = "Trans Tech Publications Ltd",

pages = "271--274",

editor = "Marc Heyns and Paul Mertens and Marc Meuris",

booktitle = "Ultra Clean Processing of Silicon Surfaces 2000",

note = "5th International Symposium on Ultra Clean Processing of Silicon Surfaces, UCPSS 2000 ; Conference date: 18-09-2000 Through 20-09-2000",

}

TY - GEN

T1 - Effect of surface charge and fluid properties on particle removal characteristics of a surface-optimized REB filter

AU - Kelly, Wayne P.

AU - Grant, Donald C.

AU - Zahka, Joseph

AU - Huang, Wayne

AU - Raghavan, Srini

PY - 2001

Y1 - 2001

KW - Filters

KW - Retention

KW - Zeta potential

UR - http://www.scopus.com/inward/record.url?scp=84954417555&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84954417555&partnerID=8YFLogxK

U2 - 10.4028/www.scientific.net/SSP.76-77.271

DO - 10.4028/www.scientific.net/SSP.76-77.271

M3 - Conference contribution

AN - SCOPUS:84954417555

SN - 9783908450573

T3 - Solid State Phenomena

SP - 271

EP - 274

BT - Ultra Clean Processing of Silicon Surfaces 2000

A2 - Heyns, Marc

A2 - Mertens, Paul

A2 - Meuris, Marc

PB - Trans Tech Publications Ltd

T2 - 5th International Symposium on Ultra Clean Processing of Silicon Surfaces, UCPSS 2000

Y2 - 18 September 2000 through 20 September 2000

ER -

Effect of surface charge and fluid properties on particle removal characteristics of a surface-optimized REB filter

Publication series

Other

Keywords

ASJC Scopus subject areas

Access to Document

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Cite this