Effect of surface charge and fluid properties on particle removal characteristics of a surface-optimized REB filter

Wayne P. Kelly; Donald C. Grant; Joseph Zahka; Wayne Huang; Srini Raghavan

Effect of surface charge and fluid properties on particle removal characteristics of a surface-optimized REB filter

Wayne P. Kelly, Donald C. Grant, Joseph Zahka, Wayne Huang, Srini Raghavan

Materials Science and Engineering

Research output: Contribution to journal › Conference article › peer-review

4 Scopus citations

Abstract

The surface properties of a filter were chosen to have complete retention of both PSL and silicon nitride particles in a wide pH range of HF. Particles were removed by non-sieving mechanisms, allowing the filter to have large pores resulting in high flow rate.

Original language	English (US)
Pages (from-to)	271-274
Number of pages	4
Journal	Diffusion and Defect Data Pt.B: Solid State Phenomena
Volume	76-77
State	Published - 2000
Event	5th Internatinal Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS 2000) - Ostend, Belgium Duration: Sep 18 2000 → Sep 20 2000

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
General Materials Science
Condensed Matter Physics
Physics and Astronomy (miscellaneous)

Cite this

@article{b37b918757134f46bf21d5755ecc4e81,

title = "Effect of surface charge and fluid properties on particle removal characteristics of a surface-optimized REB filter",

abstract = "The surface properties of a filter were chosen to have complete retention of both PSL and silicon nitride particles in a wide pH range of HF. Particles were removed by non-sieving mechanisms, allowing the filter to have large pores resulting in high flow rate.",

author = "Kelly, {Wayne P.} and Grant, {Donald C.} and Joseph Zahka and Wayne Huang and Srini Raghavan",

year = "2000",

language = "English (US)",

volume = "76-77",

pages = "271--274",

journal = "Diffusion and Defect Data Pt.B: Solid State Phenomena",

issn = "1012-0394",

publisher = "Scientific.net",

note = "5th Internatinal Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS 2000) ; Conference date: 18-09-2000 Through 20-09-2000",

}

TY - JOUR

T1 - Effect of surface charge and fluid properties on particle removal characteristics of a surface-optimized REB filter

AU - Kelly, Wayne P.

AU - Grant, Donald C.

AU - Zahka, Joseph

AU - Huang, Wayne

AU - Raghavan, Srini

PY - 2000

Y1 - 2000

N2 - The surface properties of a filter were chosen to have complete retention of both PSL and silicon nitride particles in a wide pH range of HF. Particles were removed by non-sieving mechanisms, allowing the filter to have large pores resulting in high flow rate.

AB - The surface properties of a filter were chosen to have complete retention of both PSL and silicon nitride particles in a wide pH range of HF. Particles were removed by non-sieving mechanisms, allowing the filter to have large pores resulting in high flow rate.

UR - http://www.scopus.com/inward/record.url?scp=0034498262&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0034498262&partnerID=8YFLogxK

M3 - Conference article

AN - SCOPUS:0034498262

SN - 1012-0394

VL - 76-77

SP - 271

EP - 274

JO - Diffusion and Defect Data Pt.B: Solid State Phenomena

JF - Diffusion and Defect Data Pt.B: Solid State Phenomena

T2 - 5th Internatinal Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS 2000)

Y2 - 18 September 2000 through 20 September 2000

ER -

Effect of surface charge and fluid properties on particle removal characteristics of a surface-optimized REB filter

Abstract

ASJC Scopus subject areas

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