Effect of atomic layer deposition on the quality factor of silicon nanobeam cavities

Michael Gehl; Ricky Gibson; Joshua Hendrickson; Andrew Homyk; Antti Säynätjoki; Tapani Alasaarela; Lasse Karvonen; Ari Tervonen; Seppo Honkanen; Sander Zandbergen; Benjamin C. Richards; J. D. Olitzky; Axel Scherer; Galina Khitrova; Hyatt M. Gibbs; Ju YoungKim; Yong Hee Lee

doi:10.1364/JOSAB.29.000A55

Effect of atomic layer deposition on the quality factor of silicon nanobeam cavities

Michael Gehl, Ricky Gibson, Joshua Hendrickson, Andrew Homyk, Antti Säynätjoki, Tapani Alasaarela, Lasse Karvonen, Ari Tervonen, Seppo Honkanen, Sander Zandbergen, Benjamin C. Richards, J. D. Olitzky, Axel Scherer, Galina Khitrova, Hyatt M. Gibbs, Ju YoungKim, Yong Hee Lee

Optical Sciences, College of

Research output: Contribution to journal › Article › peer-review

13 Scopus citations

Abstract

In this work we study the effect of thin-film deposition on the quality factor (Q) of silicon nanobeam cavities. We observe an average increase in the Q of 38 ± 31% in one sample and investigate the dependence of this increase on the initial nanobeam hole sizes. We note that this process can be used to modify cavities that have larger than optimal hole sizes following fabrication. Additionally, the technique allows the tuning of the cavity mode wavelength and the incorporation of new materials, without significantly degrading Q.

Original language	English (US)
Pages (from-to)	A55-A59
Journal	Journal of the Optical Society of America B: Optical Physics
Volume	29
Issue number	2
DOIs	https://doi.org/10.1364/JOSAB.29.000A55
State	Published - Feb 1 2012

ASJC Scopus subject areas

Statistical and Nonlinear Physics
Atomic and Molecular Physics, and Optics

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Gehl, M., Gibson, R., Hendrickson, J., Homyk, A., Säynätjoki, A., Alasaarela, T., Karvonen, L., Tervonen, A., Honkanen, S., Zandbergen, S., Richards, B. C., Olitzky, J. D., Scherer, A., Khitrova, G., Gibbs, H. M., YoungKim, J., & Lee, Y. H. (2012). Effect of atomic layer deposition on the quality factor of silicon nanobeam cavities. Journal of the Optical Society of America B: Optical Physics, 29(2), A55-A59. https://doi.org/10.1364/JOSAB.29.000A55

Gehl, M, Gibson, R, Hendrickson, J, Homyk, A, Säynätjoki, A, Alasaarela, T, Karvonen, L, Tervonen, A, Honkanen, S, Zandbergen, S, Richards, BC, Olitzky, JD, Scherer, A, Khitrova, G, Gibbs, HM, YoungKim, J & Lee, YH 2012, 'Effect of atomic layer deposition on the quality factor of silicon nanobeam cavities', Journal of the Optical Society of America B: Optical Physics, vol. 29, no. 2, pp. A55-A59. https://doi.org/10.1364/JOSAB.29.000A55

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AU - Alasaarela, Tapani

AU - Karvonen, Lasse

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Effect of atomic layer deposition on the quality factor of silicon nanobeam cavities

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