Dynamics of cleaning and rinsing of micro and nano structures in single-wafer cleaning tools

Keyphrases

• Cleaning Device 100%
• Surface Preparation 100%
• Surface Cleaning 100%
• Single Wafer Cleaning 100%
• Process Data Analysis 50%
• External Analysis 50%
• Processing Tool 50%
• Wafer Processing 50%
• Water Flow Rate 50%
• Semiconductor Fabrication 50%
• Multi-wafer 50%
• In-line Metrology 50%
• Online Control 50%
• Single Wafer 50%
• Clean Surface 50%
• Technology Node 50%
• Submicron Technologies 50%

Engineering

• Surface Preparation 100%
• Surface Cleaning 100%
• Semiconductor Fabrication 50%
• Resource Consumption 50%
• Control Line 50%

Material Science

• Surface Cleaning 100%