Abstract
This work focuses on using the photoexpansion effect to fabricate surface-grating structures and studying the applicability in photonic circuitry. Surface gratings with periods ranging from 2.95 μm to 0.377 μm were written holographically using 514.5-nm light from an Argon ion laser. Gratings with 2.95-μm period were also written for different exposure times to study the dose effect on surface-relief structures. AFM images of the irradiated surfaces were obtained. A He-Ne laser operating at 632.8 nm enabled to measure diffraction efficiencies.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 259-260 |
| Number of pages | 2 |
| Journal | Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS |
| State | Published - 1996 |
| Externally published | Yes |
| Event | Proceedings of the 1996 Conference on Lasers and Electro-Optics, CLEO'96 - Anaheim, CA, USA Duration: Jun 2 1996 → Jun 7 1996 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering