@inproceedings{cc3495b171a644e8b8e31635c7ab176e,
title = "Dissolution characteristics of ceria in ascorbic acid solutions with implications to cleaning",
abstract = "The interaction of ascorbic acid with ceria as well as with hydrogen peroxide produces ascorbyl radicals by oxidation. Ascorbic acid solutions containing peroxide can provide a dissolution rate of 0.1 {\AA}/min. Such solutions have potential to be used in post-CMP clean applications.",
keywords = "Ascorbic acid, Ceria particles, Post CMP cleaning, STI CMP",
author = "S. Tamilmani and V. Lowalekar and S. Raghavan and R. Small",
year = "2005",
doi = "10.4028/3-908451-06-x.283",
language = "English (US)",
isbn = "390845106X",
series = "Solid State Phenomena",
publisher = "Trans Tech Publications Ltd",
pages = "283--286",
booktitle = "Ultra Clean Processing of Silicon Surfaces VII, UCPSS 2004 - Proceedings of the 7th International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS)",
note = "7th International Symposium on Ultra Clean Processing of Silicon Surfaces, UCPSS 2004 ; Conference date: 20-09-2004 Through 22-09-2004",
}