Direct fabrication of physical relief structures via patterned photodeposition of a titanium alkoxide solution

J. David Musgraves; B. G. Potter; Timothy J. Boyle

doi:10.1364/OL.33.001306

Direct fabrication of physical relief structures via patterned photodeposition of a titanium alkoxide solution

J. David Musgraves
, B. G. Potter
, Timothy J. Boyle

Research output: Contribution to journal › Article › peer-review

5 Scopus citations

Abstract

Ultraviolet (λ=248nm) excitation of a photosensitive Ti alkoxide solution was found to generate a metal-oxide-based insoluble film on substrates in contact with the solution during illumination. Patterned deposition of 100 μm wide lines of material was demonstrated using a slit-shaped aluminum shadow mask during exposure. Stylus profilometry confirmed that the average thickness of the photodeposited film monotonically varied with accumulated UV fluence, exhibiting thicknesses of 10 to 310 nm for fluences of 12 and 192 J/cm₂, respectively. Moreover, the surface profile of the film surface at fluences greater than 12 J/cm² was found to reproduce the near-field Fresnel diffraction pattern anticipated from the slit mask used.

Original language	English (US)
Pages (from-to)	1306-1308
Number of pages	3
Journal	Optics letters
Volume	33
Issue number	12
DOIs	https://doi.org/10.1364/OL.33.001306
State	Published - Jun 15 2008
Externally published	Yes

ASJC Scopus subject areas

Atomic and Molecular Physics, and Optics

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10.1364/OL.33.001306

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title = "Direct fabrication of physical relief structures via patterned photodeposition of a titanium alkoxide solution",

abstract = "Ultraviolet (λ=248nm) excitation of a photosensitive Ti alkoxide solution was found to generate a metal-oxide-based insoluble film on substrates in contact with the solution during illumination. Patterned deposition of 100 μm wide lines of material was demonstrated using a slit-shaped aluminum shadow mask during exposure. Stylus profilometry confirmed that the average thickness of the photodeposited film monotonically varied with accumulated UV fluence, exhibiting thicknesses of 10 to 310 nm for fluences of 12 and 192 J/cm2, respectively. Moreover, the surface profile of the film surface at fluences greater than 12 J/cm2 was found to reproduce the near-field Fresnel diffraction pattern anticipated from the slit mask used.",

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year = "2008",

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doi = "10.1364/OL.33.001306",

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journal = "Optics letters",

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T1 - Direct fabrication of physical relief structures via patterned photodeposition of a titanium alkoxide solution

AU - Musgraves, J. David

AU - Potter, B. G.

AU - Boyle, Timothy J.

PY - 2008/6/15

Y1 - 2008/6/15

N2 - Ultraviolet (λ=248nm) excitation of a photosensitive Ti alkoxide solution was found to generate a metal-oxide-based insoluble film on substrates in contact with the solution during illumination. Patterned deposition of 100 μm wide lines of material was demonstrated using a slit-shaped aluminum shadow mask during exposure. Stylus profilometry confirmed that the average thickness of the photodeposited film monotonically varied with accumulated UV fluence, exhibiting thicknesses of 10 to 310 nm for fluences of 12 and 192 J/cm2, respectively. Moreover, the surface profile of the film surface at fluences greater than 12 J/cm2 was found to reproduce the near-field Fresnel diffraction pattern anticipated from the slit mask used.

AB - Ultraviolet (λ=248nm) excitation of a photosensitive Ti alkoxide solution was found to generate a metal-oxide-based insoluble film on substrates in contact with the solution during illumination. Patterned deposition of 100 μm wide lines of material was demonstrated using a slit-shaped aluminum shadow mask during exposure. Stylus profilometry confirmed that the average thickness of the photodeposited film monotonically varied with accumulated UV fluence, exhibiting thicknesses of 10 to 310 nm for fluences of 12 and 192 J/cm2, respectively. Moreover, the surface profile of the film surface at fluences greater than 12 J/cm2 was found to reproduce the near-field Fresnel diffraction pattern anticipated from the slit mask used.

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DO - 10.1364/OL.33.001306

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SN - 0146-9592

VL - 33

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EP - 1308

JO - Optics letters

JF - Optics letters

IS - 12

ER -

Direct fabrication of physical relief structures via patterned photodeposition of a titanium alkoxide solution

Abstract

ASJC Scopus subject areas

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