TY - JOUR
T1 - Determining instantaneous removal rates in metal chemical mechanical planarization
AU - Philipossian, Ricky
AU - Sampurno, Yasa
AU - Philipossian, Ara
N1 - Publisher Copyright:
© 2020 The Japan Society of Applied Physics.
PY - 2020/7/1
Y1 - 2020/7/1
N2 - We define a new scientific method, based on experimental and simulation data, for accurately determining instantaneous removal rates (i-RRs) during tungsten and copper chemical mechanical planarization. We show that i-RR changes tremendously depending on how different factors that account for RR are affected by key process parameters that change due to depth-dependent non-uniformities in film morphology, density and elemental composition. After experimentally determining how pad temperature, coefficient of friction (COF), sliding velocity and polishing pressure affect overall RRs, we use a modified Langmuir-Hinshelwood model and show that i-RR for tungsten is governed by COF and not by temperature, while i-RR for copper is a strong function of temperature, and to a lesser extent, a function of COF.
AB - We define a new scientific method, based on experimental and simulation data, for accurately determining instantaneous removal rates (i-RRs) during tungsten and copper chemical mechanical planarization. We show that i-RR changes tremendously depending on how different factors that account for RR are affected by key process parameters that change due to depth-dependent non-uniformities in film morphology, density and elemental composition. After experimentally determining how pad temperature, coefficient of friction (COF), sliding velocity and polishing pressure affect overall RRs, we use a modified Langmuir-Hinshelwood model and show that i-RR for tungsten is governed by COF and not by temperature, while i-RR for copper is a strong function of temperature, and to a lesser extent, a function of COF.
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U2 - 10.35848/1347-4065/ab8f07
DO - 10.35848/1347-4065/ab8f07
M3 - Article
AN - SCOPUS:85085649551
VL - 59
JO - Japanese Journal of Applied Physics
JF - Japanese Journal of Applied Physics
SN - 0021-4922
IS - SL
M1 - SL0803
ER -