Design approach and comparison of projection cameras for EUV lithography

Scott A. Lerner, Jose M. Sasian, Michael R. Descour

Research output: Contribution to journalArticlepeer-review

20 Scopus citations


This paper presents an approach to designing all-reflective, projection cameras for EUV lithography. We make a comparison of four-mirror cameras with numerical apertures ranging from 0.1 to 0.2 and ring-field widths from 1.0 to 3.6 mm. Additionally, we present two theoretical models that allow for the phase change introduced by multilayer coatings.

Original languageEnglish (US)
Pages (from-to)792-802
Number of pages11
JournalOptical Engineering
Issue number3
StatePublished - Mar 2000

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • General Engineering


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