Design approach and comparison of projection cameras for EUV lithography

Scott A. Lerner; Jose M. Sasian; Michael R. Descour

doi:10.1117/1.602429

Design approach and comparison of projection cameras for EUV lithography

Scott A. Lerner, Jose M. Sasian, Michael R. Descour

Research output: Contribution to journal › Article › peer-review

20 Scopus citations

Abstract

This paper presents an approach to designing all-reflective, projection cameras for EUV lithography. We make a comparison of four-mirror cameras with numerical apertures ranging from 0.1 to 0.2 and ring-field widths from 1.0 to 3.6 mm. Additionally, we present two theoretical models that allow for the phase change introduced by multilayer coatings.

Original language	English (US)
Pages (from-to)	792-802
Number of pages	11
Journal	Optical Engineering
Volume	39
Issue number	3
DOIs	https://doi.org/10.1117/1.602429
State	Published - Mar 2000

ASJC Scopus subject areas

Atomic and Molecular Physics, and Optics
General Engineering

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10.1117/1.602429

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title = "Design approach and comparison of projection cameras for EUV lithography",

abstract = "This paper presents an approach to designing all-reflective, projection cameras for EUV lithography. We make a comparison of four-mirror cameras with numerical apertures ranging from 0.1 to 0.2 and ring-field widths from 1.0 to 3.6 mm. Additionally, we present two theoretical models that allow for the phase change introduced by multilayer coatings.",

author = "Lerner, {Scott A.} and Sasian, {Jose M.} and Descour, {Michael R.}",

year = "2000",

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AU - Sasian, Jose M.

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AB - This paper presents an approach to designing all-reflective, projection cameras for EUV lithography. We make a comparison of four-mirror cameras with numerical apertures ranging from 0.1 to 0.2 and ring-field widths from 1.0 to 3.6 mm. Additionally, we present two theoretical models that allow for the phase change introduced by multilayer coatings.

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JO - Optical Engineering

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Design approach and comparison of projection cameras for EUV lithography

Abstract

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