Deposition of multiphase molybdate thin films by reactive sputtering

Joe Y. Zou; Glenn L. Schrader

doi:10.1016/S0040-6090(97)01031-6

Deposition of multiphase molybdate thin films by reactive sputtering

Joe Y. Zou, Glenn L. Schrader

Chemical and Environmental Engineering

Research output: Contribution to journal › Article › peer-review

27 Scopus citations

Abstract

Deposition parameters for reactive sputtering of thin films of MoO₃ and NiMoO₄ were examined with an emphasis of the effect of temperature, O₂/Ar flow rate, pressure, and sputtering power (RF source) or voltage (DC source). Films of α- and β-MoO₃ could be produced having oriented structures. α-NiMoO₄ could only be formed as a multicrystalline film at higher temperatures. Multilayer films of NiMoO₄ on α-MoO₃ were found to include an interfacial material identified as β-NiMoO₄. This metastable material was detected at relatively low temperatures in the bilayer structures.

Original language	English (US)
Pages (from-to)	52-62
Number of pages	11
Journal	Thin Solid Films
Volume	324
Issue number	1-2
DOIs	https://doi.org/10.1016/S0040-6090(97)01031-6
State	Published - Jul 1 1998

Keywords

Deposition
Molybdate thin films
Reactive sputtering

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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10.1016/S0040-6090(97)01031-6

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title = "Deposition of multiphase molybdate thin films by reactive sputtering",

abstract = "Deposition parameters for reactive sputtering of thin films of MoO3 and NiMoO4 were examined with an emphasis of the effect of temperature, O2/Ar flow rate, pressure, and sputtering power (RF source) or voltage (DC source). Films of α- and β-MoO3 could be produced having oriented structures. α-NiMoO4 could only be formed as a multicrystalline film at higher temperatures. Multilayer films of NiMoO4 on α-MoO3 were found to include an interfacial material identified as β-NiMoO4. This metastable material was detected at relatively low temperatures in the bilayer structures.",

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AU - Zou, Joe Y.

AU - Schrader, Glenn L.

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N2 - Deposition parameters for reactive sputtering of thin films of MoO3 and NiMoO4 were examined with an emphasis of the effect of temperature, O2/Ar flow rate, pressure, and sputtering power (RF source) or voltage (DC source). Films of α- and β-MoO3 could be produced having oriented structures. α-NiMoO4 could only be formed as a multicrystalline film at higher temperatures. Multilayer films of NiMoO4 on α-MoO3 were found to include an interfacial material identified as β-NiMoO4. This metastable material was detected at relatively low temperatures in the bilayer structures.

AB - Deposition parameters for reactive sputtering of thin films of MoO3 and NiMoO4 were examined with an emphasis of the effect of temperature, O2/Ar flow rate, pressure, and sputtering power (RF source) or voltage (DC source). Films of α- and β-MoO3 could be produced having oriented structures. α-NiMoO4 could only be formed as a multicrystalline film at higher temperatures. Multilayer films of NiMoO4 on α-MoO3 were found to include an interfacial material identified as β-NiMoO4. This metastable material was detected at relatively low temperatures in the bilayer structures.

KW - Deposition

KW - Molybdate thin films

KW - Reactive sputtering

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JO - Thin Solid Films

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IS - 1-2

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Deposition of multiphase molybdate thin films by reactive sputtering

Abstract

Keywords

ASJC Scopus subject areas

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