Damage inside borosilicate glass by a single picosecond laser pulse

Weibo Cheng; Jan Willem Pieterse; Rongguang Liang

doi:10.3390/mi12050553

Damage inside borosilicate glass by a single picosecond laser pulse

Weibo Cheng, Jan Willem Pieterse, Rongguang Liang

Optical Sciences

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

Abstract

We investigate damage inside the bulk of borosilicate glass by a single shot of IR picosecond laser pulse both experimentally and numerically. In our experiments, bulk damage of borosilicate glass with aspect ratio of about 1:10 is generated. The shape and size of the damage site are shown to correspond to an electron cloud with density of about 10²⁰ cm⁻³ . The underlying mechanism of electron generation by multiphoton ionization and avalanche ionization is numerically investigated. The multiphoton ionization rate and avalanche ionization rate are determined by fitting experimental results. The relative role of multiphoton ionization and avalanche ionization are numerically studied and the percentage of electron contribution from each ionization channel is determined.

Original language	English (US)
Article number	553
Journal	Micromachines
Volume	12
Issue number	5
DOIs	https://doi.org/10.3390/mi12050553
State	Published - May 2021

Keywords

Laser–matter interaction
Plasma dynamics
Ultrashort pulse laser processing

ASJC Scopus subject areas

Control and Systems Engineering
Mechanical Engineering
Electrical and Electronic Engineering

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10.3390/mi12050553

Cite this

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title = "Damage inside borosilicate glass by a single picosecond laser pulse",

abstract = "We investigate damage inside the bulk of borosilicate glass by a single shot of IR picosecond laser pulse both experimentally and numerically. In our experiments, bulk damage of borosilicate glass with aspect ratio of about 1:10 is generated. The shape and size of the damage site are shown to correspond to an electron cloud with density of about 1020 cm−3 . The underlying mechanism of electron generation by multiphoton ionization and avalanche ionization is numerically investigated. The multiphoton ionization rate and avalanche ionization rate are determined by fitting experimental results. The relative role of multiphoton ionization and avalanche ionization are numerically studied and the percentage of electron contribution from each ionization channel is determined.",

keywords = "Laser–matter interaction, Plasma dynamics, Ultrashort pulse laser processing",

author = "Weibo Cheng and Pieterse, {Jan Willem} and Rongguang Liang",

note = "Funding Information: Acknowledgments: We thank Shibin Jiang, Robert Norwood for all the help and support. We thank Arnaud Couairon for the inspiring discussion on the model. The author acknowledges the support from the John Kiel Scholarship sponsored by SPIE. Publisher Copyright: {\textcopyright} 2021 by the authors. Licensee MDPI, Basel, Switzerland.",

year = "2021",

month = may,

doi = "10.3390/mi12050553",

language = "English (US)",

volume = "12",

journal = "Micromachines",

issn = "2072-666X",

publisher = "Multidisciplinary Digital Publishing Institute (MDPI)",

number = "5",

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T1 - Damage inside borosilicate glass by a single picosecond laser pulse

AU - Cheng, Weibo

AU - Pieterse, Jan Willem

AU - Liang, Rongguang

N1 - Funding Information: Acknowledgments: We thank Shibin Jiang, Robert Norwood for all the help and support. We thank Arnaud Couairon for the inspiring discussion on the model. The author acknowledges the support from the John Kiel Scholarship sponsored by SPIE. Publisher Copyright: © 2021 by the authors. Licensee MDPI, Basel, Switzerland.

PY - 2021/5

Y1 - 2021/5

N2 - We investigate damage inside the bulk of borosilicate glass by a single shot of IR picosecond laser pulse both experimentally and numerically. In our experiments, bulk damage of borosilicate glass with aspect ratio of about 1:10 is generated. The shape and size of the damage site are shown to correspond to an electron cloud with density of about 1020 cm−3 . The underlying mechanism of electron generation by multiphoton ionization and avalanche ionization is numerically investigated. The multiphoton ionization rate and avalanche ionization rate are determined by fitting experimental results. The relative role of multiphoton ionization and avalanche ionization are numerically studied and the percentage of electron contribution from each ionization channel is determined.

AB - We investigate damage inside the bulk of borosilicate glass by a single shot of IR picosecond laser pulse both experimentally and numerically. In our experiments, bulk damage of borosilicate glass with aspect ratio of about 1:10 is generated. The shape and size of the damage site are shown to correspond to an electron cloud with density of about 1020 cm−3 . The underlying mechanism of electron generation by multiphoton ionization and avalanche ionization is numerically investigated. The multiphoton ionization rate and avalanche ionization rate are determined by fitting experimental results. The relative role of multiphoton ionization and avalanche ionization are numerically studied and the percentage of electron contribution from each ionization channel is determined.

KW - Laser–matter interaction

KW - Plasma dynamics

KW - Ultrashort pulse laser processing

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DO - 10.3390/mi12050553

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JO - Micromachines

JF - Micromachines

IS - 5

M1 - 553

ER -

Damage inside borosilicate glass by a single picosecond laser pulse

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Keywords

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