Corrosion inhibitors for copper in hydroxylamine-based chemistries used for CMP and post-CMP cleaning

Subramanian Tamilmani; Wayne Huang; Srini Raghavan; Robert Small

Corrosion inhibitors for copper in hydroxylamine-based chemistries used for CMP and post-CMP cleaning

Subramanian Tamilmani
, Wayne Huang
, Srini Raghavan
, Robert Small

Research output: Contribution to journal › Conference article › peer-review

Abstract

The effectiveness of benzotriazole and certain hydroxamic acids in inhibiting the corrosion of copper in hydroxylamine-based chemical systems was studied. Benzotriazole and salicylhydroxamic acid were identified to be efficient inhibitors. A detailed study of the effect of inhibitor concentration on inhibition efficiency was performed using electrochemical methods.

Original language	English (US)
Pages (from-to)	271-274
Number of pages	4
Journal	Solid State Phenomena
Volume	92
State	Published - 2003
Externally published	Yes
Event	The International Symposium on Ultra Clean Processing of Silicon Surfaces V - Ostend, Belgium Duration: Sep 16 2002 → Sep 18 2002

Keywords

Copper CMP
Corrosion inhibitors
Hydroxylamine

ASJC Scopus subject areas

Atomic and Molecular Physics, and Optics
General Materials Science
Condensed Matter Physics

Cite this

@article{b252495e64a64ed7a74cbb8b5118b111,

title = "Corrosion inhibitors for copper in hydroxylamine-based chemistries used for CMP and post-CMP cleaning",

abstract = "The effectiveness of benzotriazole and certain hydroxamic acids in inhibiting the corrosion of copper in hydroxylamine-based chemical systems was studied. Benzotriazole and salicylhydroxamic acid were identified to be efficient inhibitors. A detailed study of the effect of inhibitor concentration on inhibition efficiency was performed using electrochemical methods.",

keywords = "Copper CMP, Corrosion inhibitors, Hydroxylamine",

author = "Subramanian Tamilmani and Wayne Huang and Srini Raghavan and Robert Small",

year = "2003",

language = "English (US)",

volume = "92",

pages = "271--274",

journal = "Solid State Phenomena",

issn = "1012-0394",

publisher = "Trans Tech Publications Ltd",

note = "The International Symposium on Ultra Clean Processing of Silicon Surfaces V ; Conference date: 16-09-2002 Through 18-09-2002",

}

TY - JOUR

T1 - Corrosion inhibitors for copper in hydroxylamine-based chemistries used for CMP and post-CMP cleaning

AU - Tamilmani, Subramanian

AU - Huang, Wayne

AU - Raghavan, Srini

AU - Small, Robert

PY - 2003

Y1 - 2003

N2 - The effectiveness of benzotriazole and certain hydroxamic acids in inhibiting the corrosion of copper in hydroxylamine-based chemical systems was studied. Benzotriazole and salicylhydroxamic acid were identified to be efficient inhibitors. A detailed study of the effect of inhibitor concentration on inhibition efficiency was performed using electrochemical methods.

AB - The effectiveness of benzotriazole and certain hydroxamic acids in inhibiting the corrosion of copper in hydroxylamine-based chemical systems was studied. Benzotriazole and salicylhydroxamic acid were identified to be efficient inhibitors. A detailed study of the effect of inhibitor concentration on inhibition efficiency was performed using electrochemical methods.

KW - Copper CMP

KW - Corrosion inhibitors

KW - Hydroxylamine

UR - https://www.scopus.com/pages/publications/0038715849

UR - https://www.scopus.com/pages/publications/0038715849#tab=citedBy

M3 - Conference article

AN - SCOPUS:0038715849

SN - 1012-0394

VL - 92

SP - 271

EP - 274

JO - Solid State Phenomena

JF - Solid State Phenomena

T2 - The International Symposium on Ultra Clean Processing of Silicon Surfaces V

Y2 - 16 September 2002 through 18 September 2002

ER -

Corrosion inhibitors for copper in hydroxylamine-based chemistries used for CMP and post-CMP cleaning

Abstract

Keywords

ASJC Scopus subject areas

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