Conductive atomic force microscopy of small magnetic tunnel junctions with interface anisotropy

  • S. Majetich
  • , S. K. Piotrowski
  • , M. Bapna
  • , S. D. Oberdick
  • , M. Li
  • , C. Chien
  • , L. Tryputen
  • , C. Ross
  • , H. Almasi
  • , W. Wang

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Magnetic anisotropy at the interface between a thin metallic ferromagnet and an insulating oxide layer has been used to make devices with voltage-controlled switching [1-4]. Sharp switching thresholds have previously been reported for devices below 100 nm [3], but questions remain about the size dependence of the switching thresholds and the stability with respect to thermal fluctuations. Here a series of CoFeB (1.5 nm)/MgO (2 nm)/CoFeB (0.8 nm) magnetic tunnel junctions (MTJs) with interface anisotropy were characterized using conductive atomic force microscopy (CAFM) to measure their resistance as a function of the perpendicular magnetic field and bias voltage. With a lithographically patterned MTJ, there are two new features, relative to prior work applying this technique to nanoparticles [5]. First, both magnetic layers have a known crystallo-graphic orientation, which in this case leads to perpendicular magnetic anisotropy and increased squareness in the hysteresis loops. Second, features varying over a wide range of device diameters but the same tunnel barrier thickness have been prepared, enabling the systematic determination of size-dependent properties.

Original languageEnglish (US)
Title of host publication2015 IEEE International Magnetics Conference, INTERMAG 2015
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781479973224
DOIs
StatePublished - Jul 14 2015
Event2015 IEEE International Magnetics Conference, INTERMAG 2015 - Beijing, China
Duration: May 11 2015May 15 2015

Publication series

Name2015 IEEE International Magnetics Conference, INTERMAG 2015

Other

Other2015 IEEE International Magnetics Conference, INTERMAG 2015
Country/TerritoryChina
CityBeijing
Period5/11/155/15/15

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering
  • Surfaces, Coatings and Films

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