TY - GEN
T1 - Conductive atomic force microscopy of small magnetic tunnel junctions with interface anisotropy
AU - Majetich, S.
AU - Piotrowski, S. K.
AU - Bapna, M.
AU - Oberdick, S. D.
AU - Li, M.
AU - Chien, C.
AU - Tryputen, L.
AU - Ross, C.
AU - Almasi, H.
AU - Wang, W.
N1 - Publisher Copyright:
© 2015 IEEE.
PY - 2015/7/14
Y1 - 2015/7/14
N2 - Magnetic anisotropy at the interface between a thin metallic ferromagnet and an insulating oxide layer has been used to make devices with voltage-controlled switching [1-4]. Sharp switching thresholds have previously been reported for devices below 100 nm [3], but questions remain about the size dependence of the switching thresholds and the stability with respect to thermal fluctuations. Here a series of CoFeB (1.5 nm)/MgO (2 nm)/CoFeB (0.8 nm) magnetic tunnel junctions (MTJs) with interface anisotropy were characterized using conductive atomic force microscopy (CAFM) to measure their resistance as a function of the perpendicular magnetic field and bias voltage. With a lithographically patterned MTJ, there are two new features, relative to prior work applying this technique to nanoparticles [5]. First, both magnetic layers have a known crystallo-graphic orientation, which in this case leads to perpendicular magnetic anisotropy and increased squareness in the hysteresis loops. Second, features varying over a wide range of device diameters but the same tunnel barrier thickness have been prepared, enabling the systematic determination of size-dependent properties.
AB - Magnetic anisotropy at the interface between a thin metallic ferromagnet and an insulating oxide layer has been used to make devices with voltage-controlled switching [1-4]. Sharp switching thresholds have previously been reported for devices below 100 nm [3], but questions remain about the size dependence of the switching thresholds and the stability with respect to thermal fluctuations. Here a series of CoFeB (1.5 nm)/MgO (2 nm)/CoFeB (0.8 nm) magnetic tunnel junctions (MTJs) with interface anisotropy were characterized using conductive atomic force microscopy (CAFM) to measure their resistance as a function of the perpendicular magnetic field and bias voltage. With a lithographically patterned MTJ, there are two new features, relative to prior work applying this technique to nanoparticles [5]. First, both magnetic layers have a known crystallo-graphic orientation, which in this case leads to perpendicular magnetic anisotropy and increased squareness in the hysteresis loops. Second, features varying over a wide range of device diameters but the same tunnel barrier thickness have been prepared, enabling the systematic determination of size-dependent properties.
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U2 - 10.1109/INTMAG.2015.7157062
DO - 10.1109/INTMAG.2015.7157062
M3 - Conference contribution
AN - SCOPUS:84942475195
T3 - 2015 IEEE International Magnetics Conference, INTERMAG 2015
BT - 2015 IEEE International Magnetics Conference, INTERMAG 2015
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 2015 IEEE International Magnetics Conference, INTERMAG 2015
Y2 - 11 May 2015 through 15 May 2015
ER -