Abstract
The methodology for zero-alignment micro-optical system that takes advantage of state-of-the-art lithography fabrication techniques and bulk-micromachining of silicon is described. Results of the preliminary fabrication and micro-assembly experiments of a silicon-wafer based MOT are discussed. Further, modeling of MOT systems using non-sequential ray tracing (NSRT) is highlighted.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 167-173 |
| Number of pages | 7 |
| Journal | Proceedings of SPIE - The International Society for Optical Engineering |
| Volume | 3879 |
| State | Published - 1999 |
| Event | Proceedings of the 1999 Micromachine Technology for Diffractive and Holographic Optics - Santa Clara, CA, USA Duration: Sep 20 1999 → Sep 21 1999 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Instrumentation
- Condensed Matter Physics
- Computer Science Applications
- Applied Mathematics
- Electrical and Electronic Engineering
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