Concept for zero-alignment micro optical systems

Raviv Levy, Michael R. Descour, Randy J. Shul, Christi L. Willison, Mial E. Warren, Terho Kololuoma, Juha T. Rantala

Research output: Contribution to journalConference articlepeer-review

5 Scopus citations


The methodology for zero-alignment micro-optical system that takes advantage of state-of-the-art lithography fabrication techniques and bulk-micromachining of silicon is described. Results of the preliminary fabrication and micro-assembly experiments of a silicon-wafer based MOT are discussed. Further, modeling of MOT systems using non-sequential ray tracing (NSRT) is highlighted.

Original languageEnglish (US)
Pages (from-to)167-173
Number of pages7
JournalProceedings of SPIE - The International Society for Optical Engineering
StatePublished - 1999
Externally publishedYes
EventProceedings of the 1999 Micromachine Technology for Diffractive and Holographic Optics - Santa Clara, CA, USA
Duration: Sep 20 1999Sep 21 1999

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering


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