Compensating film stress in silicon substrates for the Lynx X-ray telescope mission concept using ion implantation

Brandon Chalifoux; Youwei Yao; Heng E. Zuo; Ralf K. Heilmann; Mark L. Schattenburg

doi:10.1117/12.2314895

Compensating film stress in silicon substrates for the Lynx X-ray telescope mission concept using ion implantation

Brandon Chalifoux, Youwei Yao, Heng E. Zuo, Ralf K. Heilmann, Mark L. Schattenburg

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

11 Scopus citations

Abstract

Ion implantation is used to correct figure errors resulting from film stress in thin silicon mirror substrates. The Lynx mission concept requires mirrors with extremely small figure errors and excellent X-ray reflectivity, and only a small portion of the mirror error budget may be allocated to distortion from film stress. While reducing film stress in itself is ideal, compensation of film stress may be required. In addition, compensation, in combination with other film stress reduction techniques, may allow freedom in making coatings with optimal x-ray performance while minimizing distortion. Ion implantation offers a rapid method of applying a precise stress distribution to the backside of a mirror, which may be used to compensate for a uniform or non-uniform film stress. In this paper, we demonstrate the use of ion implantation to achieve a roughly 10x reduction in deformation from film stress, and that the stress from ion implantation is stable over at least five months.

Original language	English (US)
Title of host publication	Space Telescopes and Instrumentation 2018
Subtitle of host publication	Ultraviolet to Gamma Ray
Editors	Shouleh Nikzad, Jan-Willem A. Den Herder, Kazuhiro Nakazawa
Publisher	SPIE
ISBN (Print)	9781510619517
DOIs	https://doi.org/10.1117/12.2314895
State	Published - 2018
Externally published	Yes
Event	Space Telescopes and Instrumentation 2018: Ultraviolet to Gamma Ray - Austin, United States Duration: Jun 10 2018 → Jun 15 2018

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	10699
ISSN (Print)	0277-786X
ISSN (Electronic)	1996-756X

Other

Other	Space Telescopes and Instrumentation 2018: Ultraviolet to Gamma Ray
Country/Territory	United States
City	Austin
Period	6/10/18 → 6/15/18

Keywords

Lynx
X-ray
figure correction
film stress
ion implantation
optics
stability
telescope

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

Access to Document

10.1117/12.2314895

Cite this

Chalifoux, B., Yao, Y., Zuo, H. E., Heilmann, R. K., & Schattenburg, M. L. (2018). Compensating film stress in silicon substrates for the Lynx X-ray telescope mission concept using ion implantation. In S. Nikzad, J.-W. A. Den Herder, & K. Nakazawa (Eds.), Space Telescopes and Instrumentation 2018: Ultraviolet to Gamma Ray Article 1069959 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 10699). SPIE. https://doi.org/10.1117/12.2314895

Compensating film stress in silicon substrates for the Lynx X-ray telescope mission concept using ion implantation. / Chalifoux, Brandon; Yao, Youwei; Zuo, Heng E. et al.
Space Telescopes and Instrumentation 2018: Ultraviolet to Gamma Ray. ed. / Shouleh Nikzad; Jan-Willem A. Den Herder; Kazuhiro Nakazawa. SPIE, 2018. 1069959 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 10699).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Chalifoux, B, Yao, Y, Zuo, HE, Heilmann, RK & Schattenburg, ML 2018, Compensating film stress in silicon substrates for the Lynx X-ray telescope mission concept using ion implantation. in S Nikzad, J-WA Den Herder & K Nakazawa (eds), Space Telescopes and Instrumentation 2018: Ultraviolet to Gamma Ray., 1069959, Proceedings of SPIE - The International Society for Optical Engineering, vol. 10699, SPIE, Space Telescopes and Instrumentation 2018: Ultraviolet to Gamma Ray, Austin, United States, 6/10/18. https://doi.org/10.1117/12.2314895

Chalifoux B, Yao Y, Zuo HE, Heilmann RK, Schattenburg ML. Compensating film stress in silicon substrates for the Lynx X-ray telescope mission concept using ion implantation. In Nikzad S, Den Herder JWA, Nakazawa K, editors, Space Telescopes and Instrumentation 2018: Ultraviolet to Gamma Ray. SPIE. 2018. 1069959. (Proceedings of SPIE - The International Society for Optical Engineering). doi: 10.1117/12.2314895

Chalifoux, Brandon ; Yao, Youwei ; Zuo, Heng E. et al. / Compensating film stress in silicon substrates for the Lynx X-ray telescope mission concept using ion implantation. Space Telescopes and Instrumentation 2018: Ultraviolet to Gamma Ray. editor / Shouleh Nikzad ; Jan-Willem A. Den Herder ; Kazuhiro Nakazawa. SPIE, 2018. (Proceedings of SPIE - The International Society for Optical Engineering).

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abstract = "Ion implantation is used to correct figure errors resulting from film stress in thin silicon mirror substrates. The Lynx mission concept requires mirrors with extremely small figure errors and excellent X-ray reflectivity, and only a small portion of the mirror error budget may be allocated to distortion from film stress. While reducing film stress in itself is ideal, compensation of film stress may be required. In addition, compensation, in combination with other film stress reduction techniques, may allow freedom in making coatings with optimal x-ray performance while minimizing distortion. Ion implantation offers a rapid method of applying a precise stress distribution to the backside of a mirror, which may be used to compensate for a uniform or non-uniform film stress. In this paper, we demonstrate the use of ion implantation to achieve a roughly 10x reduction in deformation from film stress, and that the stress from ion implantation is stable over at least five months.",

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author = "Brandon Chalifoux and Youwei Yao and Zuo, {Heng E.} and Heilmann, {Ralf K.} and Schattenburg, {Mark L.}",

note = "Funding Information: We would like to thank Will Zhang and the NGXO group at NASA Goddard Space Flight Center (GSFC), and Lester Cohen at Smithsonian Astrophysics Observatory (SAO) for helpful discussions and suggestions. In addition, we thank Kevin Woller (MIT-PSFC) for providing assistance in operating the ion accelerator at MIT, and helpful discussions. This work was financially supported by NASA APRA grants NNX14AE76G and NNX17AE47G. Publisher Copyright: {\textcopyright} 2018 SPIE.; Space Telescopes and Instrumentation 2018: Ultraviolet to Gamma Ray ; Conference date: 10-06-2018 Through 15-06-2018",

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AB - Ion implantation is used to correct figure errors resulting from film stress in thin silicon mirror substrates. The Lynx mission concept requires mirrors with extremely small figure errors and excellent X-ray reflectivity, and only a small portion of the mirror error budget may be allocated to distortion from film stress. While reducing film stress in itself is ideal, compensation of film stress may be required. In addition, compensation, in combination with other film stress reduction techniques, may allow freedom in making coatings with optimal x-ray performance while minimizing distortion. Ion implantation offers a rapid method of applying a precise stress distribution to the backside of a mirror, which may be used to compensate for a uniform or non-uniform film stress. In this paper, we demonstrate the use of ion implantation to achieve a roughly 10x reduction in deformation from film stress, and that the stress from ion implantation is stable over at least five months.

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Compensating film stress in silicon substrates for the Lynx X-ray telescope mission concept using ion implantation

Abstract

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ASJC Scopus subject areas

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