Comparison of slurry film distribution between a novel slurry injection system and conventional slurry application method

  • Y. Zhuang
  • , Y. Sampurno
  • , C. Wu
  • , B. Wu
  • , Y. Mu
  • , L. Borucki
  • , A. Philipossian
  • , R. Yang

Research output: Contribution to journalArticlepeer-review

Abstract

In this study, slurry film distribution on an embossed Politex pad was compared between a novel slurry injection system (SIS) and conventional slurry application method. The slurry injector was placed on top of the pad surface and it injected slurry in a thin layer at the device trailing edge using multiple injection points. Slurry was also applied to the pad center area using the conventional slurry application method. A fluorescent dye (4-methyl- umbelliferone) was added to the slurry. The slurry fluoresced under UV light and the fluorescent light was captured by a high resolution charged coupled device camera. Results showed that SIS provided a much more uniform slurry distribution to the pad-wafer interface than the conventional slurry application method.

Original languageEnglish (US)
Pages (from-to)625-631
Number of pages7
JournalECS Transactions
Volume60
Issue number1
DOIs
StatePublished - 2014

ASJC Scopus subject areas

  • General Engineering

Fingerprint

Dive into the research topics of 'Comparison of slurry film distribution between a novel slurry injection system and conventional slurry application method'. Together they form a unique fingerprint.

Cite this