Comparison of power dependence of microwave surface resistance of unpatterned and patterned YBCO thin film

Hao Xin; Daniel E. Oates; A. C. Anderson

doi:10.1109/22.853465

Comparison of power dependence of microwave surface resistance of unpatterned and patterned YBCO thin film

Hao Xin
, Daniel E. Oates
, A. C. Anderson

Research output: Contribution to journal › Article › peer-review

29 Scopus citations

Abstract

The effect of the patterning process on the nonlinearity of the microwave surface resistance R$ of YBCO thin films is investigated in this paper. With the use of a sapphire dielectric resonator and a stripline resonator, the microwave R§ of YBCO thin films was measured before and after the patterning process, as a function of temperature and the RF peak magnetic field in the film. The microwave loss was also modeled, assuming a J_rf dependence of Zs(J_rf) on current density J_rf. Experimental and modeled results show that the patterning has no observable effect on the microwave residual R_S or on the power dependence of R$.

Original language	English (US)
Pages (from-to)	1221-1226
Number of pages	6
Journal	IEEE Transactions on Microwave Theory and Techniques
Volume	48
Issue number	7 PART 2
DOIs	https://doi.org/10.1109/22.853465
State	Published - 2000
Externally published	Yes

Keywords

High-temperature superconductors
Superconducting films
Superconducting materials measurements
Superconducting microwave devices
Superconducting resonators

ASJC Scopus subject areas

Radiation
Condensed Matter Physics
Electrical and Electronic Engineering

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10.1109/22.853465

Cite this

@article{13b051dd16614aaa950c4f622929e8ea,

title = "Comparison of power dependence of microwave surface resistance of unpatterned and patterned YBCO thin film",

abstract = "The effect of the patterning process on the nonlinearity of the microwave surface resistance R\$ of YBCO thin films is investigated in this paper. With the use of a sapphire dielectric resonator and a stripline resonator, the microwave R§ of YBCO thin films was measured before and after the patterning process, as a function of temperature and the RF peak magnetic field in the film. The microwave loss was also modeled, assuming a Jrf dependence of Zs(Jrf) on current density Jrf. Experimental and modeled results show that the patterning has no observable effect on the microwave residual RS or on the power dependence of R\$.",

keywords = "High-temperature superconductors, Superconducting films, Superconducting materials measurements, Superconducting microwave devices, Superconducting resonators",

author = "Hao Xin and Oates, \{Daniel E.\} and Anderson, \{A. C.\}",

note = "Funding Information: Manuscript received January 30, 2000. This work was supported by the Air Force Office of Scientific Research. H. Xin is with the Department of Physics, Massachusetts Institute of Technology, Cambridge, MA 02139 USA., and is also with the Lincoln Laboratory, Massachusetts Institute of Technology, Lexington, MA 02420 USA, and the Air Force Research Laboratory, Hanscom AFB, Bedford, MA 01731 USA. D. E. Oates is with the Department of Physics, Massachusetts Institute of Technology, Cambridge, MA 02139 USA., and also with the Lincoln Laboratory, Massachusetts Institute of Technology, Lexington, MA 02420 USA. A. C. Anderson and R. L. Slattery are with the Lincoln Laboratory, Massachusetts Institute of Technology, Lexington, MA 02420 USA. G. Dresselhaus is with the Department of Physics, Massachusetts Institute of Technology, Cambridge, MA 02139 USA., and is also with the Air Force Research Laboratory, Hanscom AFB, Bedford, MA 01731 USA. M. S. Dresselhaus is with the Department of Physics, Massachusetts Institute of Technology, Cambridge, MA 02139 USA. Publisher Item Identifier S 0018-9480(00)05545-9.",

year = "2000",

doi = "10.1109/22.853465",

language = "English (US)",

volume = "48",

pages = "1221--1226",

journal = "IEEE Transactions on Microwave Theory and Techniques",

issn = "0018-9480",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

number = "7 PART 2",

}

TY - JOUR

T1 - Comparison of power dependence of microwave surface resistance of unpatterned and patterned YBCO thin film

AU - Xin, Hao

AU - Oates, Daniel E.

AU - Anderson, A. C.

N1 - Funding Information: Manuscript received January 30, 2000. This work was supported by the Air Force Office of Scientific Research. H. Xin is with the Department of Physics, Massachusetts Institute of Technology, Cambridge, MA 02139 USA., and is also with the Lincoln Laboratory, Massachusetts Institute of Technology, Lexington, MA 02420 USA, and the Air Force Research Laboratory, Hanscom AFB, Bedford, MA 01731 USA. D. E. Oates is with the Department of Physics, Massachusetts Institute of Technology, Cambridge, MA 02139 USA., and also with the Lincoln Laboratory, Massachusetts Institute of Technology, Lexington, MA 02420 USA. A. C. Anderson and R. L. Slattery are with the Lincoln Laboratory, Massachusetts Institute of Technology, Lexington, MA 02420 USA. G. Dresselhaus is with the Department of Physics, Massachusetts Institute of Technology, Cambridge, MA 02139 USA., and is also with the Air Force Research Laboratory, Hanscom AFB, Bedford, MA 01731 USA. M. S. Dresselhaus is with the Department of Physics, Massachusetts Institute of Technology, Cambridge, MA 02139 USA. Publisher Item Identifier S 0018-9480(00)05545-9.

PY - 2000

Y1 - 2000

N2 - The effect of the patterning process on the nonlinearity of the microwave surface resistance R$ of YBCO thin films is investigated in this paper. With the use of a sapphire dielectric resonator and a stripline resonator, the microwave R§ of YBCO thin films was measured before and after the patterning process, as a function of temperature and the RF peak magnetic field in the film. The microwave loss was also modeled, assuming a Jrf dependence of Zs(Jrf) on current density Jrf. Experimental and modeled results show that the patterning has no observable effect on the microwave residual RS or on the power dependence of R$.

AB - The effect of the patterning process on the nonlinearity of the microwave surface resistance R$ of YBCO thin films is investigated in this paper. With the use of a sapphire dielectric resonator and a stripline resonator, the microwave R§ of YBCO thin films was measured before and after the patterning process, as a function of temperature and the RF peak magnetic field in the film. The microwave loss was also modeled, assuming a Jrf dependence of Zs(Jrf) on current density Jrf. Experimental and modeled results show that the patterning has no observable effect on the microwave residual RS or on the power dependence of R$.

KW - High-temperature superconductors

KW - Superconducting films

KW - Superconducting materials measurements

KW - Superconducting microwave devices

KW - Superconducting resonators

UR - https://www.scopus.com/pages/publications/0034224431

UR - https://www.scopus.com/pages/publications/0034224431#tab=citedBy

U2 - 10.1109/22.853465

DO - 10.1109/22.853465

M3 - Article

AN - SCOPUS:0034224431

SN - 0018-9480

VL - 48

SP - 1221

EP - 1226

JO - IEEE Transactions on Microwave Theory and Techniques

JF - IEEE Transactions on Microwave Theory and Techniques

IS - 7 PART 2

ER -

Comparison of power dependence of microwave surface resistance of unpatterned and patterned YBCO thin film

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