@inproceedings{a64cabd9e5964ab8a13f6b86fa6f5235,
title = "Comparison of gold particle removal from fused silica and thermal oxide surfaces in dilute ammonium hydroxide solutions",
abstract = "Removal of gold particles (40 nm and 100 nm) from fused silica and thermal oxide surfaces in dilute ammonium hydroxide solutions has been investigated. The particle removal efficiency (PRE) from fused silica surface has been found to be a strong function of ammonium hydroxide concentration and bath temperature. PRE increases from 0 to 85 % with increase in bath temperature from 30 to 80 °C for ammonium hydroxide concentration of 1 %. Addition of megasonic energy to the ammonium hydroxide bath at 30 °C has also shown to improve the PRE significantly. In the case of thermal oxide, the removal of gold particles is much easier compared to that from fused silica. Even for cleaning at 30 °C, the PRE for oxide surface increases from 10 to 90 % with increase in ammonium hydroxide concentration from 0 % to 4 %. Atomic force microscopy measurements reveal that an adhesion force of 10 mN/m exists between fused silica and gold particles in 4 % ammonium hydroxide solution as opposed to only repulsive force in the case of thermal oxide.",
keywords = "Ammonium hydroxide, Cleaning, Deep UV mask, Fused silica, Gold particles, Megasonic energy, Thermal oxide",
author = "Viraj Pandit and Manish Keswani and Shariq Siddiqui and Srini Raghavan",
year = "2012",
doi = "10.4028/www.scientific.net/SSP.187.159",
language = "English (US)",
isbn = "9783037853887",
series = "Solid State Phenomena",
publisher = "Trans Tech Publications Ltd",
pages = "159--162",
booktitle = "Ultra Clean Processing of Semiconductor Surfaces X",
note = "10th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2010 ; Conference date: 20-09-2010 Through 22-09-2010",
}