TY - JOUR
T1 - Compact snapshot dual-mode interferometric system for on-machine measurement
AU - Wang, Daodang
AU - Fu, Xiangyu
AU - Xu, Ping
AU - Tian, Xiaobo
AU - Spires, Oliver
AU - Liang, Jian
AU - Wu, Heng
AU - Liang, Rongguang
N1 - Funding Information:
This work is supported by National Natural Science Foundation of China (NSFC) ( 51775528 ), Guangxi Key Laboratory of Optoelectronic Information Processing ( GD18205 ), China Postdoctoral Science Foundation ( 2017M621928 ), National Science Foundation (NSF) ( 1455630 and 1918260 ), National Institutes of Health (NIH) ( S10OD018061 ).
Publisher Copyright:
© 2020
PY - 2020/9
Y1 - 2020/9
N2 - To meet the need of on-machine metrology in optical manufacturing, a compact and snapshot dual-mode interferometric system is proposed for surface shape and roughness measurement. To simplify the measurement process between surface shape and roughness, a novel concept of using optical filters to separate the beam paths in the reference arm is introduced. A pixelated camera with a micro-polarizer array acquires four pi/2 phase-shifted interferograms simultaneously to minimize the environmental disturbance. Besides, the configuration-optimization-based subaperture stitching technique is introduced to extend the measurable aperture range. Both numerical analysis and experiments have been carried out to demonstrate the feasibility of the proposed compact snapshot dual-mode interferometer. The proposed system provides a powerful and portable tool to achieve on-machine surface characterization of various optical elements over a wide range of spatial frequencies and aperture sizes.
AB - To meet the need of on-machine metrology in optical manufacturing, a compact and snapshot dual-mode interferometric system is proposed for surface shape and roughness measurement. To simplify the measurement process between surface shape and roughness, a novel concept of using optical filters to separate the beam paths in the reference arm is introduced. A pixelated camera with a micro-polarizer array acquires four pi/2 phase-shifted interferograms simultaneously to minimize the environmental disturbance. Besides, the configuration-optimization-based subaperture stitching technique is introduced to extend the measurable aperture range. Both numerical analysis and experiments have been carried out to demonstrate the feasibility of the proposed compact snapshot dual-mode interferometer. The proposed system provides a powerful and portable tool to achieve on-machine surface characterization of various optical elements over a wide range of spatial frequencies and aperture sizes.
KW - Dual-mode interferometer
KW - On-machine measurement
KW - Optical interferometry
KW - Subaperture stitching
UR - http://www.scopus.com/inward/record.url?scp=85084269413&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=85084269413&partnerID=8YFLogxK
U2 - 10.1016/j.optlaseng.2020.106129
DO - 10.1016/j.optlaseng.2020.106129
M3 - Article
AN - SCOPUS:85084269413
VL - 132
JO - Optics and Lasers in Engineering
JF - Optics and Lasers in Engineering
SN - 0143-8166
M1 - 106129
ER -