CHEMICAL VAPOR DEPOSITION OF HIGH TEMPERATURE SILICON DIOXIDE.

Since its introduction in the mid-1970's, Vacuum-CVD high temperature oxide (HTO) has found numerous applications in the semiconductor industry. It is most extensively used as a primary or secondary passivation layer over silicon devices, and can be used as an intermediate coating applied to a substrate to minimize hysteresis and enhance adhesion. This work describes the design, construction, and performance of a V-CVD system for the large-scale industrial production of thin-film HTO, on circular substrates up to 150mm in diameter.