@inproceedings{c5438829fb4a4e939236724a7ee000a7,

title = "Characterizing dielectric tensors from angle-of-incidence mueller matrix images",

abstract = "Biaxial ellipsometry is a technique that measures the dielectric tensor and thickness of a biaxial substrate, single-layer thin film, or multi-layer structure. The dielectric tensor of a biaxial material consists of the real and imaginary parts of the three orthogonal principal indices (nx+ ikx, ny+ iky and nz + ikz) and three Euler angles (⊖, Φ Δ) to describe its orientation. The method utilized in this work measures an angle-of-incidence Mueller matrix from a Mueller matrix imaging Polarimeter equipped with a pair of microscope objectives with low polarization aberrations. The dielectric tensors for multilayer samples are determined from multi-spectral angle-of-incidence Mueller matrix images in either a transmission or reflection mode using an appropriate dispersion model. Given approximate a priori knowledge of the dielectric tensor and film thickness, a Jones matrix image is first calculated by solving Maxwell's equations at each surface which is then transformed into a Mueller matrix image. An optimization algorithm then finds the best fit dielectric tensor based on matching the measured and calculated angle-of-incidence Mueller matrix images. One use for this application is to more accurately determine the dielectric tensors of biaxial films used in liquid crystal displays.",

keywords = "Biaxial, Birefringent, Dielectric tensor, Ellipsometry, Polarimetry",

author = "Smith, {Paula K.} and Chipman, {Russell A.}",

year = "2007",

doi = "10.1117/12.735335",

language = "English (US)",

isbn = "9780819468307",

series = "Proceedings of SPIE - The International Society for Optical Engineering",

booktitle = "Polarization Science and Remote Sensing III",

note = "Polarization Science and Remote Sensing III ; Conference date: 29-08-2007 Through 30-08-2007",

}