@inproceedings{9786c2c911cc48bead57b8937801f219,
title = "Characterization of photoresist and study on developed resist profile for the fabrication of gray-scale diffractive optic elements",
abstract = "We have characterized photoresist used for fabrication of gray-scale diffractive optic elements using Dill's and Mack's parameters. Using the fast-marching method, simulations of resist profiles have been shown to match experimental results.",
author = "Park, {Jong Rak} and Youngsik Kim and Melissa Zaverton and Justin Sierchio and Milster, {Tom D.}",
year = "2010",
doi = "10.1364/oft.2010.otuc4",
language = "English (US)",
isbn = "9781557528933",
series = "Optics InfoBase Conference Papers",
publisher = "Optical Society of America (OSA)",
booktitle = "Optical Fabrication and Testing, OFT 2010",
note = "Optical Fabrication and Testing, OFT 2010 ; Conference date: 13-06-2010 Through 17-06-2010",
}