Characterization of photoresist and simulation of a developed resist profile for the fabrication of gray-scale diffractive optic elements

Jong Rak Park; Justin Sierchio; Melissa Zaverton; Youngsik Kim; Tom D. Milster

doi:10.1117/1.OE.51.2.023401

Characterization of photoresist and simulation of a developed resist profile for the fabrication of gray-scale diffractive optic elements

Jong Rak Park, Justin Sierchio, Melissa Zaverton, Youngsik Kim, Tom D. Milster

Optical Sciences

Research output: Contribution to journal › Article › peer-review

3 Scopus citations

Abstract

We have characterized a photoresist used for the fabrication of gray-scale diffractive optic elements in terms of Dill's and Mack's model parameters. The resist model parameters were employed for the simulations of developed resist profiles for sawtooth patterns executed by solving the Eikonal equation with the fast-marching method. The simulated results were shown to be in good agreement with empirical data.

Original language	English (US)
Article number	023401
Journal	Optical Engineering
Volume	51
Issue number	2
DOIs	https://doi.org/10.1117/1.OE.51.2.023401
State	Published - Feb 2012

Keywords

diffractive optic element
gray-scale lithography
laser direct writer
photoresist characterization
resist profile simulation

ASJC Scopus subject areas

Atomic and Molecular Physics, and Optics
General Engineering

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10.1117/1.OE.51.2.023401

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abstract = "We have characterized a photoresist used for the fabrication of gray-scale diffractive optic elements in terms of Dill's and Mack's model parameters. The resist model parameters were employed for the simulations of developed resist profiles for sawtooth patterns executed by solving the Eikonal equation with the fast-marching method. The simulated results were shown to be in good agreement with empirical data.",

keywords = "diffractive optic element, gray-scale lithography, laser direct writer, photoresist characterization, resist profile simulation",

author = "Park, {Jong Rak} and Justin Sierchio and Melissa Zaverton and Youngsik Kim and Milster, {Tom D.}",

note = "Funding Information: This study was supported by the research fund of Chosun University, 2011.",

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AU - Park, Jong Rak

AU - Sierchio, Justin

AU - Zaverton, Melissa

AU - Kim, Youngsik

AU - Milster, Tom D.

N1 - Funding Information: This study was supported by the research fund of Chosun University, 2011.

PY - 2012/2

Y1 - 2012/2

N2 - We have characterized a photoresist used for the fabrication of gray-scale diffractive optic elements in terms of Dill's and Mack's model parameters. The resist model parameters were employed for the simulations of developed resist profiles for sawtooth patterns executed by solving the Eikonal equation with the fast-marching method. The simulated results were shown to be in good agreement with empirical data.

AB - We have characterized a photoresist used for the fabrication of gray-scale diffractive optic elements in terms of Dill's and Mack's model parameters. The resist model parameters were employed for the simulations of developed resist profiles for sawtooth patterns executed by solving the Eikonal equation with the fast-marching method. The simulated results were shown to be in good agreement with empirical data.

KW - diffractive optic element

KW - gray-scale lithography

KW - laser direct writer

KW - photoresist characterization

KW - resist profile simulation

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Characterization of photoresist and simulation of a developed resist profile for the fabrication of gray-scale diffractive optic elements

Abstract

Keywords

ASJC Scopus subject areas

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