Characterization of cavitation in ultrasonic or megasonic irradiated gas saturated solutions using a hydrophone

M. Zhao, R. Balachandran, P. R. Madigappu, P. Yam, C. Zanelli, R. Sierra, M. Keswani

Research output: Chapter in Book/Report/Conference proceedingConference contribution

4 Scopus citations
Original languageEnglish (US)
Title of host publicationUltra Clean Processing of Semiconductor Surfaces XII
EditorsPaul W. Mertens, Marc Meuris, Marc Heyns, Marc Meuris, Marc Heyns
PublisherTrans Tech Publications Ltd
Pages165-169
Number of pages5
ISBN (Electronic)9783038352426
DOIs
StatePublished - 2015
Event12th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2014 - Brussels, Belgium
Duration: Sep 21 2014Sep 24 2014

Publication series

NameSolid State Phenomena
Volume219
ISSN (Print)1012-0394
ISSN (Electronic)1662-9779

Other

Other12th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2014
Country/TerritoryBelgium
CityBrussels
Period9/21/149/24/14

Keywords

  • Cavitation
  • Feature damage
  • Hydrophone
  • Megasonic
  • Ultrasonic
  • Wafer cleaning

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • General Materials Science
  • Condensed Matter Physics

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