@inproceedings{b306b587b71744548631f7c27e0fcfbc,
title = "Characterization of cavitation in a single wafer or photomask cleaning tool",
abstract = "A novel transducer for megasonic cleaning of photomasks presents an approach that differs from previous configurations, and appears to have unique features for cleaning while minimizing damage. As the cleaning and damage processes are determined by the presence of cavitation, a thorough acoustic analysis was performed on the device, by using a calibrated hydrophone scanned at the photomask location, and a quartz photomask with embedded sensors.",
keywords = "Cavitation, Cleaning, Hydrophone, Megasonic, Microstreaming, Photomask, Sensor Array, Transient, Ultrasonic",
author = "Xi Chen and Petrie Yam and Manish Keswani and Nagaya Okada and Zanelli, {Claudio I.}",
note = "Publisher Copyright: {\textcopyright} 2016 Trans Tech Publications, Switzerland.; 13th International Symposium on Ultra Clean Processing of Semiconductor Surfaces , UCPSS 2016 ; Conference date: 12-09-2016 Through 14-09-2016",
year = "2016",
doi = "10.4028/www.scientific.net/SSP.255.207",
language = "English (US)",
isbn = "9783035710847",
series = "Solid State Phenomena",
publisher = "Trans Tech Publications Ltd",
pages = "207--212",
editor = "Mertens, {Paul W.} and Marc Meuris and Marc Meuris and Marc Heyns",
booktitle = "Ultra Clean Processing of Semiconductor Surfaces XIII",
}