Central aperture detection for auto direct read-write photoresist fabrication and inspection

Justin M. Sierchio, Melissa Zaverton, Lee Johnson, Victor Densmore, Thomas D Milster

Research output: Contribution to journalArticlepeer-review


We show the design for a laser scanning microscopy defect detection system based upon the idea that the light can reflect off a photoresist-laden fused-silica sample containing defects, allowing height and depth information to be obtained through changes in light intensity. Image registration using predefined points is employed. Image processing techniques involving median and deconvolution filtering are used. Results show that the 2.1-μm resolution of these defects is obtainable, and receiver operating characteristic curves are used for quantifying results. Discriminabilities of 0.73 are achieved. Preliminary results for larger-array patterns through stitching processes are also shown.

Original languageEnglish (US)
Article number084104
JournalOptical Engineering
Issue number8
StatePublished - Aug 2014


  • central aperture
  • direct read
  • fabrication
  • inspection system
  • photoresist

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Engineering(all)


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