Buried oxide formation in low-dose low-energy SIMOX

Tula Jutarosaga, Jun Sik Jeoung, Supapan Seraphin

Research output: Contribution to journal › Article › peer-review

Original language	English (US)
Pages (from-to)	504-505
Number of pages	2
Journal	Microscopy and Microanalysis
Volume	9
Issue number	SUPPL. 2
DOIs	https://doi.org/10.1017/s1431927603442529
State	Published - 2003
Externally published	Yes

ASJC Scopus subject areas

@article{812db31cc4ea42b19612d7f25dca4e40,

title = "Buried oxide formation in low-dose low-energy SIMOX",

author = "Tula Jutarosaga and Jeoung, {Jun Sik} and Supapan Seraphin",

year = "2003",

doi = "10.1017/s1431927603442529",

language = "English (US)",

volume = "9",

pages = "504--505",

journal = "Microscopy and Microanalysis",

issn = "1431-9276",

publisher = "Cambridge University Press",

number = "SUPPL. 2",

}

TY - JOUR

T1 - Buried oxide formation in low-dose low-energy SIMOX

AU - Jutarosaga, Tula

AU - Jeoung, Jun Sik

AU - Seraphin, Supapan

PY - 2003

Y1 - 2003

UR - http://www.scopus.com/inward/record.url?scp=0041922334&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0041922334&partnerID=8YFLogxK

U2 - 10.1017/s1431927603442529

DO - 10.1017/s1431927603442529

M3 - Article

AN - SCOPUS:0041922334

SN - 1431-9276

VL - 9

SP - 504

EP - 505

JO - Microscopy and Microanalysis

JF - Microscopy and Microanalysis

IS - SUPPL. 2

ER -