Abstract
This study reports in-situ observations of the buckling evolution of microelectromechanical structures during etching of their underneath sacrificial layers. As the etching went on, the buckling pattern evolved from mode I, the sinusoidal half-waves, to mode II, the constrained sinusoidal half-waves, to mode III, the conventional mode, and finally to mode IV, the blisterlike local buckling. Closed formulae were derived from theoretical analysis, and the experimental results agreed well with the theoretical ones.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 155-160 |
| Number of pages | 6 |
| Journal | Materials Research Society Symposium - Proceedings |
| Volume | 518 |
| DOIs | |
| State | Published - 1998 |
| Externally published | Yes |
| Event | Proceedings of the 1998 MRS Spring Symposium - San Francisco, CA, USA Duration: Apr 15 1998 → Apr 16 1998 |
ASJC Scopus subject areas
- General Materials Science
- Condensed Matter Physics
- Mechanics of Materials
- Mechanical Engineering