Broadband UV small-spot spectroscopic ellipsometer

Timothy R. Piwonka-Corle; Torsten R. Kaack; K. F. Scoffone; Xing Chen; K. B. Malwankar; Mark E. Keefer; Lloyd J. LaComb; Jean Louis Stehle; Jean P. Piel; Dorian Zahorski; O. Thomas; J. P. Rey; L. Escadafals

doi:10.1117/12.209239

Broadband UV small-spot spectroscopic ellipsometer

Timothy R. Piwonka-Corle, Torsten R. Kaack, K. F. Scoffone, Xing Chen, K. B. Malwankar, Mark E. Keefer, Lloyd J. LaComb, Jean Louis Stehle, Jean P. Piel, Dorian Zahorski, O. Thomas, J. P. Rey, L. Escadafals

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

1 Scopus citations

Abstract

The design of the world's first production worthy broadband ultra-violet and visible small spot spectroscopic ellipsometer is described. The instrument, called the Prometrix UV-1250SE, was developed by the Prometrix division of Tencor Instruments in cooperation with SOPRA S.A., a pioneer in the field of spectroscopic ellipsometry. It has the ability to measure both the thickness and refractive index of different layers on a wide variety of materials in multiple layer film stacks. In this paper the optical system will be reviewed and spot size data presented. We will further discuss some of the design considerations such as the angle of incidence and allowed spread of the collection beam. Data characterizing the precision and stability of the instrument is presented for a variety of films including SiO₂ on silicon, and Si₃N₄ on silicon, and a multiple layer stack of SiO₂/poly- Si/SiO₂ on silicon.

Original language	English (US)
Title of host publication	Proceedings of SPIE - The International Society for Optical Engineering
Publisher	Society of Photo-Optical Instrumentation Engineers
Pages	114-125
Number of pages	12
Volume	2439
ISBN (Print)	0819417874, 9780819417879
DOIs	https://doi.org/10.1117/12.209239
State	Published - 1995
Externally published	Yes
Event	Integrated Circuit Metrology, Inspection, and Process Control IX - Santa Clara, CA, USA Duration: Feb 20 1995 → Feb 22 1995

Other

Other	Integrated Circuit Metrology, Inspection, and Process Control IX
City	Santa Clara, CA, USA
Period	2/20/95 → 2/22/95

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

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10.1117/12.209239

Cite this

Piwonka-Corle, T. R., Kaack, T. R., Scoffone, K. F., Chen, X., Malwankar, K. B., Keefer, M. E., LaComb, L. J., Stehle, J. L., Piel, J. P., Zahorski, D., Thomas, O., Rey, J. P., & Escadafals, L. (1995). Broadband UV small-spot spectroscopic ellipsometer. In Proceedings of SPIE - The International Society for Optical Engineering (Vol. 2439, pp. 114-125). Society of Photo-Optical Instrumentation Engineers. https://doi.org/10.1117/12.209239

Piwonka-Corle, TR, Kaack, TR, Scoffone, KF, Chen, X, Malwankar, KB, Keefer, ME, LaComb, LJ, Stehle, JL, Piel, JP, Zahorski, D, Thomas, O, Rey, JP & Escadafals, L 1995, Broadband UV small-spot spectroscopic ellipsometer. in Proceedings of SPIE - The International Society for Optical Engineering. vol. 2439, Society of Photo-Optical Instrumentation Engineers, pp. 114-125, Integrated Circuit Metrology, Inspection, and Process Control IX, Santa Clara, CA, USA, 2/20/95. https://doi.org/10.1117/12.209239

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title = "Broadband UV small-spot spectroscopic ellipsometer",

abstract = "The design of the world's first production worthy broadband ultra-violet and visible small spot spectroscopic ellipsometer is described. The instrument, called the Prometrix UV-1250SE, was developed by the Prometrix division of Tencor Instruments in cooperation with SOPRA S.A., a pioneer in the field of spectroscopic ellipsometry. It has the ability to measure both the thickness and refractive index of different layers on a wide variety of materials in multiple layer film stacks. In this paper the optical system will be reviewed and spot size data presented. We will further discuss some of the design considerations such as the angle of incidence and allowed spread of the collection beam. Data characterizing the precision and stability of the instrument is presented for a variety of films including SiO2 on silicon, and Si3N4 on silicon, and a multiple layer stack of SiO2/poly- Si/SiO2 on silicon.",

author = "Piwonka-Corle, {Timothy R.} and Kaack, {Torsten R.} and Scoffone, {K. F.} and Xing Chen and Malwankar, {K. B.} and Keefer, {Mark E.} and LaComb, {Lloyd J.} and Stehle, {Jean Louis} and Piel, {Jean P.} and Dorian Zahorski and O. Thomas and Rey, {J. P.} and L. Escadafals",

year = "1995",

doi = "10.1117/12.209239",

language = "English (US)",

isbn = "0819417874",

volume = "2439",

pages = "114--125",

booktitle = "Proceedings of SPIE - The International Society for Optical Engineering",

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AU - Piwonka-Corle, Timothy R.

AU - Kaack, Torsten R.

AU - Scoffone, K. F.

AU - Chen, Xing

AU - Malwankar, K. B.

AU - Keefer, Mark E.

AU - LaComb, Lloyd J.

AU - Stehle, Jean Louis

AU - Piel, Jean P.

AU - Zahorski, Dorian

AU - Thomas, O.

AU - Rey, J. P.

AU - Escadafals, L.

PY - 1995

Y1 - 1995

N2 - The design of the world's first production worthy broadband ultra-violet and visible small spot spectroscopic ellipsometer is described. The instrument, called the Prometrix UV-1250SE, was developed by the Prometrix division of Tencor Instruments in cooperation with SOPRA S.A., a pioneer in the field of spectroscopic ellipsometry. It has the ability to measure both the thickness and refractive index of different layers on a wide variety of materials in multiple layer film stacks. In this paper the optical system will be reviewed and spot size data presented. We will further discuss some of the design considerations such as the angle of incidence and allowed spread of the collection beam. Data characterizing the precision and stability of the instrument is presented for a variety of films including SiO2 on silicon, and Si3N4 on silicon, and a multiple layer stack of SiO2/poly- Si/SiO2 on silicon.

AB - The design of the world's first production worthy broadband ultra-violet and visible small spot spectroscopic ellipsometer is described. The instrument, called the Prometrix UV-1250SE, was developed by the Prometrix division of Tencor Instruments in cooperation with SOPRA S.A., a pioneer in the field of spectroscopic ellipsometry. It has the ability to measure both the thickness and refractive index of different layers on a wide variety of materials in multiple layer film stacks. In this paper the optical system will be reviewed and spot size data presented. We will further discuss some of the design considerations such as the angle of incidence and allowed spread of the collection beam. Data characterizing the precision and stability of the instrument is presented for a variety of films including SiO2 on silicon, and Si3N4 on silicon, and a multiple layer stack of SiO2/poly- Si/SiO2 on silicon.

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DO - 10.1117/12.209239

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SN - 9780819417879

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SP - 114

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BT - Proceedings of SPIE - The International Society for Optical Engineering

PB - Society of Photo-Optical Instrumentation Engineers

T2 - Integrated Circuit Metrology, Inspection, and Process Control IX

Y2 - 20 February 1995 through 22 February 1995

ER -

Broadband UV small-spot spectroscopic ellipsometer

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