Atomically precise surface engineering of silicon CCDs for enhanced UV quantum efficiency

Engineering & Materials Science

• Atomic layer deposition 32%
• Characterization (materials science) 18%
• Charge coupled devices 73%
• Detectors 50%
• Fabrication 15%
• Molecular beam epitaxy 33%
• Quantum efficiency 100%
• Silicon 50%

Physics & Astronomy

• atomic layer epitaxy 22%
• characterization 11%
• charge coupled devices 58%
• detectors 35%
• engineering 47%
• fabrication 12%
• molecular beam epitaxy 18%
• performance 9%
• quantum efficiency 56%
• silicon 34%

Chemical Compounds

• Atomic Layer Epitaxy 74%
• Molecular Beam Epitaxy 92%
• Surface 20%