Applications of Raman spectroscopy in copper chemical mechanical planarization: In situ detection of tantalum layer to dielectric layer transition

S. Kondoju, C. Juncker, P. Lucas, S. Raghavan, P. Fischer, A. Oehler, M. Moinpour

Research output: Contribution to journal › Article › peer-review

1 Scopus citations

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Physics & Astronomy