TY - GEN
T1 - Anti-reflection coatings for silicon ultraviolet detectors
AU - Hamden, Erika
AU - Blacksberg, Jordana
AU - Jacquot, Blake
AU - Jones, Todd
AU - Hoenk, Michael
AU - Dickie, Matt
AU - Nikzad, Shouleh
AU - Schiminovich, David
PY - 2010
Y1 - 2010
N2 - We report on the development of UV anti-reflection coatings for silicon CCDs, optimized for use in a UV spectrograph. Typical UV detectors have very low quantum efficiency. We report on progress in the development of a CCD detector with theoretical QE of greater than 60% in wavelengths from 100 to 300nm. This high efficiency may be reached by coating a backside illuminated, thinned, delta-doped CCD with a thin film anti-reflection coating. We discuss coatings covering the entire range of interest using sputtered and thermally evaporated MgF, HfO2, SiO2, MgO, and Al2O3. Preliminary testing has shown great promise for this method.
AB - We report on the development of UV anti-reflection coatings for silicon CCDs, optimized for use in a UV spectrograph. Typical UV detectors have very low quantum efficiency. We report on progress in the development of a CCD detector with theoretical QE of greater than 60% in wavelengths from 100 to 300nm. This high efficiency may be reached by coating a backside illuminated, thinned, delta-doped CCD with a thin film anti-reflection coating. We discuss coatings covering the entire range of interest using sputtered and thermally evaporated MgF, HfO2, SiO2, MgO, and Al2O3. Preliminary testing has shown great promise for this method.
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M3 - Conference contribution
AN - SCOPUS:84896758501
SN - 9781557528919
T3 - Optics InfoBase Conference Papers
BT - Optical Interference Coatings, OIC 2010
T2 - Optical Interference Coatings, OIC 2010
Y2 - 6 June 2010 through 11 June 2010
ER -