An evaporative co-assembly method for highly-ordered inverse opal films

Benjamin Hatton, Lidiya Mishchenko, Robert Norwood, Stan Davis, Kenneth Sandhage, Joanna Aizenberg

Research output: Contribution to journalConference articlepeer-review

4 Scopus citations


Colloidal self-assembly holds promise for photonic applications as a solution-based, low-cost alternative to top-down photolithography, if significant control of uniformity and defects can be achieved. Herein we demonstrate a new evaporative co-assembly method for highly-uniform inverse opal thin films that involves the self-assembly of polymer colloids in a solution containing a silicate precursor. Nanoporous inverse opal films can be made crack-free and with highly uniform orientation at the cm scale. The silicate between the colloids appears to increase the strength against cracking. This control of defects makes this method well-suited for the low cost fabrication of such films as sensors and photonic devices.

Original languageEnglish (US)
Article number72050F
JournalProceedings of SPIE - The International Society for Optical Engineering
StatePublished - 2009
EventAdvanced Fabrication Technologies for Micro/Nano Optics and Photonics II - San Jose, CA, United States
Duration: Jan 26 2009Jan 28 2009


  • Colloid
  • Inverse opal
  • Photonic crystal
  • Self-assembly
  • Silica

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering


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